On-line calibrating method for FRC (Flow Ratio Controller), system and plasma treatment equipment

A proportional controller and calibration method technology, applied in the field of microelectronics, can solve problems affecting process stability and uniformity, reduce product quality, FRC calibration, etc., to avoid process stability decline, reduce time spent, and eliminate equipment failures Effect

Active Publication Date: 2011-05-11
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Abstract
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  • Application Information

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Problems solved by technology

Once the actual output ratio of FRC deviates from the preset ratio, it will directly affect the stability and uniformity of the process, thereby reducing product quality
However, there is currently no effective method to calibrate the accuracy of the FRC without stopping the machine, that is, the online calibration of the FRC cannot be realized
Therefore, in actual production, the process quality degradation problem caused by inaccurate FRC cannot be corrected in time, until the deviation of FRC expands to be very obvious and causes a certain loss, the machine will be stopped for calibration, and the existing FRC calibration method requires first Disassemble it and use specific equipment, the calibration procedure is complicated and inefficient
Therefore, since FRC cannot be calibrated online at present, it is not only impossible to avoid the loss caused by FRC deviation in the process, but also stopping the calibration of FRC will seriously affect the production efficiency of the equipment, which is not conducive to the overall capacity utilization of the equipment.

Method used

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  • On-line calibrating method for FRC (Flow Ratio Controller), system and plasma treatment equipment
  • On-line calibrating method for FRC (Flow Ratio Controller), system and plasma treatment equipment
  • On-line calibrating method for FRC (Flow Ratio Controller), system and plasma treatment equipment

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Embodiment Construction

[0038] In order for those skilled in the art to better understand the technical solution of the present invention, the FRC online calibration method, system and plasma processing equipment provided by the present invention will be described in detail below with reference to the accompanying drawings.

[0039] The FRC online calibration method provided by the present invention is used to calibrate the actual output ratio of each output terminal of the FRC. The FRC has an input terminal and multiple (at least two) output terminals, and its function is to distribute the gas from its input terminal to each output terminal according to a preset ratio. see image 3 , the method comprises the following steps: 1) obtaining the actual flow value of each output end of the FRC; 2) calculating the actual output ratio of the FRC according to the actual flow value of each output end; 3) performing the FRC according to the preset ratio and the actual output ratio calibration.

[0040] Wher...

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Abstract

The invention provides an on-line calibrating method for an FRC, and further provides a system and plasma treatment equipment. The on-line calibrating method comprises the following steps: 1) acquiring the actual flow value of each output terminal of the FRC; 2) calculating the actual output proportion of the FRC; and 3) calibrating the FRC. The on-line calibrating system for the FRC comprises a flow value acquisition unit, a calculating unit and a calibrating unit. The plasma treatment equipment comprises a gas source, the FRC, a gas nozzle, a process cavity and a gas suction device, and conducts on-line calibration to the FRC by applying the on-line calibrating method and / or system provided by the invention. The on-line calibrating method, the system and the plasma treatment equipment, which are provided by the invention, have the advantages of high calibration efficiency, no need of machine halt and the like.

Description

technical field [0001] The invention relates to the technical field of microelectronics, in particular to an online calibration method, system and plasma processing equipment of a flow proportional controller. Background technique [0002] With the continuous advancement of science and technology, semiconductors and related products are widely used in all aspects of production and life. At the same time, enterprises and consumers continue to put forward higher requirements for product quality. Therefore, as a person skilled in the art, it is necessary to continuously improve and innovate the production equipment in order to adapt to new market demands. [0003] Plasma processing equipment and technology are the main technical means for semiconductor device processing. Its working principle is to excite the process gas into a plasma state through the action of high-energy electric field and magnetic field, and make certain components in the plasma and silicon Semiconductor d...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G05B23/02G05B23/00G01F1/34H01L21/00
Inventor 武小娟
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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