Mems microphone and method for manufacturing same
A technology of microelectronic machinery and manufacturing methods, which is applied in the direction of electrostatic transducer microphones, microphones, microelectronic microstructure devices, etc., can solve the problems of higher microphone height, higher manufacturing unit price, and increased manufacturing process, and achieve reduction Height, reduction of manufacturing process, effect of preventing cracking
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[0050] Specific examples of the MEMS microphone of the present invention to achieve the above object will be described.
[0051] A first embodiment of the MEMS microphone of the present invention will be described.
[0052] Figure 1a to Figure 1c is a cross-sectional view showing a step of forming a void forming portion on a silicon substrate in the first embodiment of the MEMS microphone of the present invention.
[0053] refer to Figure 1a and Figure 1b , the MEMS microphone includes a silicon substrate 10 . On both sides of the silicon substrate 10, silicon nitride (Si 3 N 4 ) or silicon oxide (SiO 2 ) and other insulating protective layers 11, 12 (refer to Figure 1a ). At this time, the silicon nitride is vapor-deposited with protective layers 11 and 12 on the surface of the silicon substrate 10 by low pressure vapor deposition (LPCVD: Low Pressure Chemical Vapor Deposition).
[0054] The insulating protective layer 11 on the upper side of the silicon substrate...
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