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Method for manufacturing copper cylinder through pattern transfer

A technology of pattern transfer and production method, which is applied in the direction of semiconductor/solid-state device manufacturing, electrical components, circuits, etc., to achieve the effect of increasing roughness, solving appearance defects, and enhancing bonding ability

Inactive Publication Date: 2011-05-18
PEKING UNIV FOUNDER GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to solve the problems existing in the prior art, the present invention proposes a copper column pattern transfer manufacturing method, which solves the problem in the prior art that the copper column and the metal layer are closely combined when the pattern is electroplated on the copper column, and reduces leakage in the post-production process. Plating, peeling off and other problems, in order to achieve smooth interconnection between layers

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  • Method for manufacturing copper cylinder through pattern transfer
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Embodiment Construction

[0024] Specific embodiments of the present invention will be described below in conjunction with the accompanying drawings.

[0025] The main purpose of the present invention is to solve the problem of connection and disconnection caused by electroplating leakage and poor combination of copper pillar and metal layer in the production of copper pillar pattern with dry film thickness higher than 75um. Of course, it is also applicable to the production of copper pillar patterns with a dry film thickness less than 75um.

[0026] The present invention adopts the following technical scheme: use heat curing to reinforce the photosensitive resist after photosensitive photoresist, increase the degree of polymerization of the photosensitive resist and the bonding force with the metal layer, pass the Plasma etching cleans the exposed metal layer and adjusts the wettability of the photoresist surface with the electroplating solution.

[0027] The main process steps are as follows:

[00...

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Abstract

The invention discloses a method for manufacturing a copper cylinder through pattern transfer, which solves the problems in the prior art that a copper cylinder is tightly combined with a metal layer during pattern plating of the copper cylinder, and in the post process step manufacturing process, skip plating is reduced, stripping and falling are generated and the like, so as to realize inter-layer smooth interconnection. The method particularly comprises the following steps of: attaching a photosensitive anticorrosive additive on the surface of a metal layer to form a photosensitive pattern; performing thermo-curing to reinforce the sensitized photosensitive anticorrosive additive; and dissolving the unexposed photosensitive anticorrosive additive in weak alkaline solution, and cleaning the surface of the exposed metal layer. The method provided by the invention can increase the roughness of a gold surface, thereby enhancing the bonding capacity of gold threads, and simultaneously solving the problem of outlook defects generated therefrom.

Description

technical field [0001] The invention belongs to the field of production and production of packaging substrates, in particular a copper column pattern transfer manufacturing method applied to packaging substrates. Background technique [0002] In the packaging substrate process, the copper pillar lamination method will be used. This method has high connection stability and is less affected by the external environment of the packaging substrate application. In the process of using copper pillar build-up method, the height of copper pillars affects the thickness of the dielectric layer of the packaging substrate. At present, the application in this field is mainly for the dry film thickness less than 75um, and the copper pillar pattern transfer with the dry film thickness higher than 75um During production, problems such as disconnection and disconnection often occur due to electroplating leaks and poor bonding of copper pillars and metal layers. [0003] In the prior art, the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/48
Inventor 苏新虹
Owner PEKING UNIV FOUNDER GRP CO LTD
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