Micro leveling mechanism of projection objective of lithography machine

A technology of projection objective lens and lithography machine, which is applied to microlithography exposure equipment, optics, optical components, etc., can solve the problems of low control precision, difficult processing and design of support structure, inconvenient operation, etc., and achieves a simple mechanism structure. , The control of precision is simple and accurate, and the effect of easy processing and adjustment

Inactive Publication Date: 2011-08-03
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology

[0004] In order to solve the problems of difficult processing and design of the existing support structure, inconvenient operation, and low control precision, the present invention provides a fine-leveling mechanism for projection objective lens of a lithography machine, which has a simple structure, is convenient for processing and assembly, and has a high degree of precision control. simpler and more precise

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  • Micro leveling mechanism of projection objective of lithography machine
  • Micro leveling mechanism of projection objective of lithography machine
  • Micro leveling mechanism of projection objective of lithography machine

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Embodiment Construction

[0017] The present invention will be described in further detail below in conjunction with the accompanying drawings and specific examples.

[0018] like figure 1 As shown, the projection objective lens micro-leveling mechanism of the lithography machine of the present invention is used to support and adjust the projection objective lens 1 with the objective lens flange 6, and the leveling mechanism includes a mounting substrate 2, a plurality of support adjustment lever mechanisms 4, fixing screws 5 and Install screw 3. Each support adjustment lever mechanism 4 is made of lever mounting base 7, adjustment lever 8, adjustment screw 11, shaft 9, shaft end cover 12, preload spring 16 and adjustment nut 14, etc., see figure 2 . The support adjustment lever mechanism 4 fixes the lever installation base 7 and the installation substrate 2 through the fixing screws 5 , and connects the installation flange 6 of the projection objective lens 1 with the front end of the adjustment le...

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Abstract

The invention discloses a micro leveling mechanism of a projection objective of a lithography machine, and belongs to the technical field of projection lithography. The mechanism mainly consists of a mounting substrate, three support adjusting lever mechanisms, mounting pieces and fixing pieces, wherein each support adjusting lever mechanism consists of a lever mounting base, an adjusting lever, an adjusting screw, a shaft, a shaft end cover, a pre-tightening spring, an adjusting screw and the like; and the lever mounting bases of the support adjusting lever mechanisms are fixed with the mounting substrate through the fixing pieces, and objective flanges are connected with the front ends of the adjusting levers through the mounting pieces. The micro leveling mechanism is uniformly distributed on the edge of an objective in a three-point support mode; through the support adjusting lever mechanisms, not only the precision of thread adjustment can be improved, but also the load borne on threads can be reduced; and the amplification factors of the levers can be set according to different precision requirements.

Description

technical field [0001] The invention relates to a fine-leveling mechanism of lithography equipment in the technical field of projection lithography, in particular to a fine-leveling mechanism of a projection objective lens of a lithography machine. Background technique [0002] Projection lithography is crucial to the manufacture of large-scale integrated circuits. It can be said that the level of projection lithography technology determines the manufacturing level of integrated circuits. The projection objective determines the graphic transfer capability of the projection lithography machine and is the core of the lithography machine. However, the installation accuracy of the projection objective lens also has a great influence on the image transfer capability of the projection lithography system, so the support and leveling of the projection objective lens are also very important. [0003] The supporting and leveling methods of existing projection objective lenses are mos...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G02B7/02
Inventor 向阳齐克奇
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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