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4F optical system for laser near field resolution measurement

An optical system and resolution technology, applied in the optical field, can solve the problems of low precision, large and complex system, inconvenient use, etc., and achieve the effects of high precision, convenient use and simple structure

Inactive Publication Date: 2011-09-14
XI'AN INST OF OPTICS & FINE MECHANICS - CHINESE ACAD OF SCI
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Problems solved by technology

Although the usual resolution measurement system also conforms to the conjugate relationship between near-field object plane and near-field image plane imaging, and can meet the requirements of near-field resolution measurement, its accuracy is low, the system is huge and complex, and it is very inconvenient to use.

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  • 4F optical system for laser near field resolution measurement
  • 4F optical system for laser near field resolution measurement
  • 4F optical system for laser near field resolution measurement

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Embodiment Construction

[0017] see figure 1 , the invention provides a 4f optical system for laser near-field resolution measurement, which includes a collimating element for collimating incident light, a converging element for converging incident light, and a detector; collimating element, converging The element and the detector are sequentially arranged on the same optical axis. The collimating element may be a first lens unit 2 formed by a positive lens and / or a negative lens; the converging element may be a second lens unit 3 formed by a negative lens and / or a positive lens.

[0018] When the collimating element forms the first lens unit 2 only by a negative lens or a positive lens, the first lens unit 2 is a biconvex lens, a plano-convex lens, a meniscus lens or a biconcave lens.

[0019] When the first lens unit 2 formed by the collimating element by a negative lens and a positive lens, the first lens unit 2 at least includes a meniscus negative lens and a biconvex positive lens; a meniscus ne...

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Abstract

The invention relates to a 4F optical system for laser near field resolution measurement. The 4F optical system comprises a divergent element for diverging incident light, a convergence element for converging the incident light and a detector; and the divergent element, the convergence element and the detector are arranged on the same optical axis in sequence. The 4F optical system is high in measurement precision, simple in structure and convenience in use.

Description

technical field [0001] The invention belongs to the field of optics, and relates to an optical system for measurement, in particular to a 4f optical system for laser near-field resolution measurement. Background technique [0002] In the process of laser transmission, it needs to go through the steps of sampling, transmission and shrinking of multi-level and multiple optical components. Due to the defects of the optical components themselves in this process, it is bound to affect the quality of the laser beam. The laser beam itself is reflected in the change of the energy distribution of the beam, the distortion of the wavefront of the beam, and the change of the modulation degree and contrast of the beam on the detector. In order to be able to accurately evaluate the parameters of the laser beam, it is necessary to establish an accurate beam parameter measurement device in order to accurately measure the parameters and feed back to the system as a guide for beam correction....

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01J1/04G01J9/00G02B27/00G02B27/30
Inventor 李红光董晓娜达争尚
Owner XI'AN INST OF OPTICS & FINE MECHANICS - CHINESE ACAD OF SCI
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