Aperture diaphragm control device based on FPGA (field programmable gate array)

Abstract

The invention discloses an aperture diaphragm control device based on an FPGA (field programmable gate array), and the device provided by the invention is used for adjusting an aperture diaphragm to a target position. The aperture diaphragm control device based on the FPGA comprises the aperture diaphragm, a drive motor, a sensor, an analog-digital converter, a target position setting module, theFPGA and a digital-analog converter, wherein the drive motor is connected with the aperture diaphragm, and used for changing the position of the aperture diaphragm; the sensor is connected with the aperture diaphragm, and used for sensing the current position information of the aperture diaphragm so as to obtain a current position analog signal; and the analog-digital converter is connected with the sensor, and used for converting the current position analog signal into a current position digital signal; the target position setting module is used for setting the target position information ofthe aperture diaphragm and obtaining a target position digital signal; the FPGA is connected with the analog-digital converter and the target position setting module, and used for obtaining a digitalcontrol signal through a PID (proportion integration differentiation) algorithm according to the difference between the target position digital signal and the current position digital signal; and thedigital-analog converter is connected with the FPGA, and used for converting the digital control signal into an analog control signal, and outputting the analog control signal to the drive motor.

Description

technical field [0001] The invention relates to the technical field of silicon semiconductor devices, in particular to an aperture diaphragm control device based on a Field Programmable Logic Gate Array (FPGA). Background technique [0002] With the continuous shrinking of the feature size of VLSI, projection lithography technology has been developed rapidly, and improving the resolution of lithography is the core of lithography technology. Photolithography resolution refers to the minimum feature size that can be exposed on the surface of silicon wafers by lithography equipment, which is the most important performance index of lithography equipment. In lithography equipment, the numerical aperture (Numerical Aperture, NA value) of the projection objective lens directly affects the lithography resolution, so it is particularly important to improve the resolution of the NA value. Usually, a position-adjustable aperture diaphragm is provided in the projection objective lens t...

AI Technical Summary

Problems solved by technology

This kind of control algorithm solved by software program has the problem of program runaway or computer malfunction, so manual reset is required to restart the operation, which may easily cause damage to the aperture diaphragm

In addition, the operating speed, integration and NA value resolution of the aperture diaphragm control device based on MCU or DSP are not enough

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