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Absorbent for selectively removing H2S and organic sulfur

An absorbent, H2S technology, applied in the separation of dispersed particles, chemical instruments and methods, separation methods, etc., can solve the problems that have not yet been reported on polyamide-amine compounds

Inactive Publication Date: 2012-07-18
CHINA PETROLEUM & CHEM CORP +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] In the existing field of gas purification and separation, there is no report on the use of polyamide-amine compounds as a selective desulfurization solution formulation

Method used

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  • Absorbent for selectively removing H2S and organic sulfur
  • Absorbent for selectively removing H2S and organic sulfur

Examples

Experimental program
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Effect test

Embodiment 1

[0026] Raw natural gas (pressure 1.5MPa, room temperature, H 2 S 1.0%, CO 2 5.8%, COS 200mg / m 3 ), using the absorbent of the present invention, with 48%w of MDEA and 2% of the polyamide-amine dendrimers stirred evenly after the composite desulfurization solution is absorbent, purified gas H 2 S3 , H in the regenerated acid gas 2 S content > 30%.

Embodiment 2

[0028] Raw natural gas (pressure 4.6 MPa, room temperature, H 2 S 4.8%, CO 2 10.2%, COS 200mg / m 3 , MeSH 200mg / m 3 ), using the absorbent of the present invention, the polyamide-amine with 40%w of MDEA, 5% of 2-amino-2 methyl-1 propanol and 5% of ethylenediamine as the core is uniformly mixed for desulfurization The solution is the absorbent, and the purified gas H 2 S3 , H in the regenerated acid gas 2 S content>50%.

Embodiment 3

[0030] Raw natural gas (pressure 8.3MPa, room temperature, H 2 S 10.1%, CO 2 21.2%, COS 300mg / m 3 , COS 50mg / m 3 , MeSH 500mg / m 3 , EtSH 50 mg / m 3 ), using the absorbent of the present invention, using 25%w of MDEA, 10% of hydroxyethylpiperazine and 15% of ethylenediamine as the core polyamide-amine mixture to stir the compound desulfurization solution as the absorbent, Purified gas H 2 S2 The sum of organic sulfur such as , MeSH and EtSH is 150mg / m 3 around, the H in the regenerated acid gas 2 S content>50%.

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PUM

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Abstract

The invention belongs to the technical field of desulfurization, and relates to an absorbent for selectively removing H2S and organic sulfur. An aqueous solution formed by mixing 1 to 15 mass percent of polyamide-amine dendritic compound with high desulfurization selectivity and 50 to 10 mass percent of alcohol amine is used as the absorbent. Under the conventional desulfurization process flow and the unit equipment condition, the absorbent can selectively remove the H2S or the organic sulfur or the H2S and the organic sulfur from one of CO2 and H2S and / or COS, CS2, RSH and the like or mixed airflow of multiple organic sulfurs, has better H2S removal selectivity and higher organic sulfur removal rate compared with a conventional alcohol amine solvent, and reduces the circulating quantity of the solution.

Description

technical field [0001] The invention belongs to the technical field of gas separation, in particular to a 2 and H 2 S and / or COS, CS 2 In a mixed gas stream of one or more organic sulfur such as , RSH, etc., one-step selective removal of H 2 S or organic sulfur, or H 2 Absorbent for S and organic sulfur. Background technique [0002] Natural gas, oilfield associated gas, refinery gas, synthesis gas and other industrial gas streams contain a certain amount of H 2 S, CO 2 and organic sulfur (COS, CS 2 , Methyl mercaptan, ethane mercaptan, propylene mercaptan and other mercaptans (RSH)). h 2 S and COS, CS 2 The existence of organic sulfur such as , RSH, etc. not only seriously threatens personal safety, but also causes corrosion of equipment and pipelines, and can poison various catalysts in the subsequent production process, which are pollutants that must be eliminated or controlled. In the above industrial gas stream, CO 2 Usually with H 2 S exists simultaneously,...

Claims

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Application Information

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IPC IPC(8): B01D53/14
Inventor 毛松柏周志斌朱道平
Owner CHINA PETROLEUM & CHEM CORP
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