Method and device for measuring surface shape error of optical element at high precision

A technology of optical components and surface shape error, which is applied in the direction of using optical devices, measuring devices, instruments, etc., can solve the problems of cumbersome calibration of interferometers, high prices, and high requirements for the test environment, and achieve simple, fast and cost-effective testing and calibration processes. cheap effect

Inactive Publication Date: 2012-07-25
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
View PDF3 Cites 14 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] The precise detection of the surface error of optical components usually uses the method of interferometry. It is necessary to calibrate the measurement error of the interferomet

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method and device for measuring surface shape error of optical element at high precision
  • Method and device for measuring surface shape error of optical element at high precision
  • Method and device for measuring surface shape error of optical element at high precision

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0016] Specific implementation mode one, combination Figure 1 to Figure 4 To illustrate this embodiment, a high-precision testing device for surface error of optical elements described in this embodiment, the detection device 1, the illumination system 2, the rotatable aperture plate 3 and the optical element 4 to be tested; the rotatable The small orifice plate 3 is provided with small holes 5, a central hole 6 and a square hole 7; the rotatable small orifice plate 3 rotates with the central hole 6 as the center; the distance between the small hole 5 and the central hole 6 is the same as the square hole 7 to the center The distances of the holes 6 are equal, and the diameters of the central holes 6 are respectively λ / 2NA, where NA is the numerical aperture of the optical element under test; λ is the wavelength of the light beam emitted by the illumination system 2; the light beam emitted by the illumination system 2 passes through a rotatable The center hole 6 of the small or...

Example Embodiment

[0020] DETAILED DESCRIPTION Two. A high-precision testing method for the surface profile of an optical element, which is implemented by the following steps:

[0021] Step A, build the detection platform of the optical imaging system;

[0022] Step B. Align the detection device 1 in the detection platform described in step 1 with the small hole 5 on the rotatable orifice plate 3, and move the precise axial fine-tuning guide 9 in the detection device 1 back and forth to obtain the small hole 5 Different defocused star point images of diffraction;

[0023] Step C: Calculate the optical wavefront error of the detection device 1;

[0024] Step D. Align the detection device 1 in the detection platform described in step 1 with the larger square hole 7 on the rotatable orifice plate 3, and move the precision axial fine-tuning guide 9 in the detection device 1 back and forth. Obtain images of different defocused star points passing through the square hole 7;

[0025] Step E: Calculate and obta...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a method and device for measuring the surface shape error of an optical element at high precision, belonging to the technical field of optical testing. The device is low in cost and can be used for measuring rapidly and conveniently at high precision and correcting the measurement error per se and has a relatively low requirement for the measurement environment. According to the method and the device, the principles of the phase recovery method and the point diffraction interferometer are merged together, and a small hole is used for generating ideal spherical waves for the device, thus the surface shape error of the optical element is measured at high precision. The method and the device can be used for measuring the surface shape error of the optical element, and the device can be calibrated at high precision. The method and the device have the characteristics of low cost and high precision and can be used by the optical imaging system producing enterprises and the optical imaging system studying and detecting units.

Description

technical field [0001] The invention relates to the technical field of optical testing, in particular to a high-precision testing method for surface error of optical elements. Background technique [0002] The precise detection of the surface error of optical components usually uses the method of interferometry. It is necessary to calibrate the measurement error of the interferometer when using the interferometer for a long time. The calibration operation of the interferometer is very cumbersome and expensive, and the impact on the test environment The requirements are also very high. The method of phase recovery to detect the surface shape of optical components is being extensively researched. Augustus J.E.M Janssen extended the Nijboer-Zernike theory and obtained the Extended Nijboer-Zernike (ENZ) theory, which can be applied to the calculation of the optical point spread function in the case of defocus. Joseph J.M. Braat, Peter Dirksen, Augustus J.E.M Janssen, Arthur S....

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G01B11/24
Inventor 马冬梅邵晶
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products