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Array substrate and method for manufacturing the same

A technology of an array substrate and a manufacturing method, applied in the field of array substrates and their manufacturing, can solve the problems of the electrical properties of Pixel and the adverse effects of black matrix design, etc.

Inactive Publication Date: 2014-09-24
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0017] The present invention provides an array substrate and its manufacturing method, which are used to solve the problem of adverse effects on Pixel electrical properties and black matrix design caused by the application of Half-tone technology in the prior art

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  • Array substrate and method for manufacturing the same
  • Array substrate and method for manufacturing the same
  • Array substrate and method for manufacturing the same

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Embodiment Construction

[0032] The array substrate provided by the present invention and its manufacturing method will be described in more detail below with reference to the drawings and embodiments.

[0033] The present invention aims at FFS (Fringe Field Switching) applying the Half-tone technology in step S203 to the adverse effect on Pixel electrical properties and BM design, proposes a new array array substrate manufacturing process suitable for liquid crystal panels, which can effectively Prevent the occurrence of the above problems and increase the aperture ratio.

[0034] The implementation of the present invention provides a method for manufacturing an array substrate, including: forming a patterned active layer on the gate insulating layer, the active layer covering part of the gate insulating layer; using the insulating layer on the S / D layer as the S / D layer D layer etching mask, on the active layer and the gate insulating layer, make a patterned S / D layer and an insulating layer with vi...

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Abstract

The invention discloses an array substrate and a manufacturing method thereof. The method comprises: forming a patterned active layer on a gate insulating layer, the active layer covering a part of the gate insulating layer; utilizing the insulating layer on the S / D layer layer as a mask for S / D layer etching, on the active layer and gate insulating layer, make a patterned S / D layer and an insulating layer with vias on the S / D layer, the S / D The layers include a source and a drain forming a channel therebetween. The invention can effectively prevent adverse effects on Pixel electrical properties and BM design due to the application of the Half-tone technology in the manufacturing process of the original FFS array.

Description

technical field [0001] The present invention relates to the technical field of displays, in particular to an array substrate and a manufacturing method thereof. Background technique [0002] TFT-LCD (Thin Film Transistor-Liquid Crystal Display, Thin Film Field Effect Transistor-Liquid Crystal Display) is a type of active matrix liquid crystal display, with higher contrast and richer colors, and the screen update frequency is also faster. [0003] The display screen is composed of many pixels that can emit light of any color. As long as each pixel is controlled to display the corresponding color, the purpose can be achieved. TFT-LCD generally adopts backlight technology. In order to accurately control the color and brightness of each pixel, it is necessary to set a thin film field effect transistor with switching function at each pixel. [0004] The three primary colors of the pixel are red R, green G and blue B, so the position of a pixel point is equipped with red color fi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/77H01L29/786G02F1/1362G02F1/1368
CPCG02F1/1368H01L27/1288H01L29/66765H01L29/66477H01L29/786
Inventor 王丹邵喜斌其他发明人请求不公开姓名
Owner BOE TECH GRP CO LTD