Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Novel broad-breadth sun-shading material and preparation method thereof

A wide and new technology, applied in the field of new wide sunshade materials

Inactive Publication Date: 2012-09-19
FUNDANT CHANGZHOU ADVANCED METAL TECH
View PDF5 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, the aforementioned new materials only have one of the properties, and there are no reports on materials with light reduction, shading, and heat insulation properties at the same time.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Novel broad-breadth sun-shading material and preparation method thereof
  • Novel broad-breadth sun-shading material and preparation method thereof
  • Novel broad-breadth sun-shading material and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] Example 1: Al 2 o 3 / Ag / Al 2 o 3 / VO 2 .W / Al 2 o 3 Film Preparation Method

[0025] The optical PET film roll material with a thickness of 8um and a width of 1000mm is used as the substrate material A, and enters the reaction chamber of the magnetron sputtering device smoothly and continuously through a set of tension control guide rollers 3a, and the deposition surface of the substrate is placed downward, which can effectively To prevent granular impurities from contaminating the substrate surface, the reaction chamber is vacuumed to 2×10 -3 Pa, at Figure II The medium 5ms-a target uses 99.99% alumina ceramics as the target material, Ar as the sputtering gas and pure O 2 As an auxiliary ion-enhanced gas input reaction chamber, transparent Al was deposited by DC reactive magnetron sputtering 2 o 3 Floor. Sputtering / reaction enhancing gas flow ratio Ar:O 2 =1:3, the gas pressure is 1.0Pa, the sputtering power is 2000W, and the substrate temperature is normal...

Embodiment 2

[0033] Example 2: TiN / VO 2 .Mo / SiO 2 / Ag / Al 2 o 3 / Ag / Al 2 o 3 Film Preparation Method

[0034] The optical EVA film roll material with a thickness of 25um and a width of 1800mm is used as the substrate material A, and enters the reaction chamber of the magnetron sputtering device smoothly and continuously through a set of tension control guide rollers 3a, and the deposition surface of the substrate is placed downward, which can effectively To prevent granular impurities from contaminating the substrate surface, the reaction chamber is vacuumed to 2×10 -3 Pa, at Figure II In the 5ms-a target position, metal Ti is used as the target material, Ar is used as the sputtering gas and pure N2 is used as the reactive gas to supply the ion source into the reaction chamber, and the transparent Ti layer is deposited by DC reactive magnetron sputtering. Flow ratio of sputtering / reaction enhancing gas Ar:N 2 =1:2, the gas pressure is 1.0Pa, the sputtering power is 2800W, and the s...

Embodiment 3

[0045] Example 3: ZnO / Ag / ZnO / VO 2 .Cu / ZnO film preparation method

[0046] The substrate material A is a glass fiber cloth roll material with a thickness of 100um and a width of 2500mm, which enters the reaction chamber of the magnetron sputtering device smoothly and continuously through a set of tension control guide rollers 3a, and the deposition surface of the substrate is placed downward, which can effectively To prevent granular impurities from contaminating the substrate surface, the reaction chamber is vacuumed to 2×10 -3 Pa, at Figure II The medium 5ms-a target uses 99.99% alumina ceramics as the target material, Ar as the sputtering gas and pure O 2 As an auxiliary ion-enhanced gas input into the reaction chamber, a transparent ZnO layer is deposited by DC reactive magnetron sputtering. Sputtering / reaction enhancing gas flow ratio Ar:O 2 =1:3, the gas pressure is 1.0Pa, the sputtering power is 2000W, and the substrate temperature is 80°C, and the deposition growt...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
widthaaaaaaaaaa
Login to View More

Abstract

The invention relates to a novel broad-breadth sun-shading material which consists of a substrate film, a dielectric film, a metal film, a dielectric film, a VO2-doped film and a dielectric film, wherein the dielectric film, the metal film, the dielectric film, the VO2-doped film and the dielectric film are deposited on the substrate film in sequence. A preparation method of the sun-shading material comprises the following steps of: taking a flexible continuous coil with a thickness of 8 mum and a width of 1000-2500 mm as a substrate; flattening with a guide roller and continuously entering a magnetron sputtering device reaction chamber; vacuumizing the reaction chamber, wherein the vacuum degree is not lower than 2*10-3 Pa; and depositing all the films on a substrate by adopting a vacuum film-coating technology. The sun-shading material simultaneously has the performances of light reducing and shading, and heat insulation.

Description

technical field [0001] The invention relates to a novel wide-width sunshade material and a manufacturing method thereof. Background technique [0002] In recent years, various materials and technologies have been introduced into the field of curtains and sunshade films. Such as thermal insulation materials, which can block outdoor heat from entering in summer and reduce indoor heat loss in winter; light reduction and shading materials can adapt to people's needs for different intensity of light, and solve the problem of insufficient indoor light when sunlight is completely blocked by ordinary sunshade materials. . With the change of consumers' aesthetic concepts and the gradual strengthening of environmental protection awareness, these two new materials are sought after by consumers. [0003] However, the above-mentioned new materials only have one of the properties, and there are no reports on materials that have the properties of light reduction, shading, and heat insula...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B32B15/04B32B9/04C23C14/35
Inventor 励征
Owner FUNDANT CHANGZHOU ADVANCED METAL TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products