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Bilayer coating device of crystalline silicon solar cell

A technology for solar cells and coating equipment, used in coatings, circuits, electrical components, etc., can solve problems such as large equipment, increased equipment manufacturing difficulty and cost, and unstable inter-chip uniformity.

Inactive Publication Date: 2014-04-23
山东力诺太阳能电力股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Plate coating equipment mainly relies on increasing the length and width of the reaction chamber to increase production capacity, but increasing the length and width of the reaction chamber will result in more bulky equipment, and a larger coating area will lead to more unstable uniformity between sheets, greatly increasing Difficulty and cost of equipment manufacturing

Method used

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  • Bilayer coating device of crystalline silicon solar cell
  • Bilayer coating device of crystalline silicon solar cell
  • Bilayer coating device of crystalline silicon solar cell

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] Place the upper carrier board 7 and the download board 8 on the silicon wafer 9, and then place the upper carrier board 7 on the download board 8. The upper air inlet 1 and the lower air inlet 2 are filled with gas silane and ammonia. The silane flow rate is 500 sccm and the ammonia flow rate The heating device 4 heats the temperature of the reaction chamber 10 to 390 degrees Celsius, the power of the upper plasma source 5 and the lower plasma source 6 is 3200w, and the moving speed of the upper carrier board 7 and the download board 8 is 156cm / min, which can realize double-layer silicon wafer 9 coating, the thickness of the 9 film layers of the upper and lower silicon wafers is about 85nm, and the refractive index is about 2.05, which meets the requirements of the production process. Each layer of graphite board can place five rows and nine rows of silicon wafers, and the coating of double-layer silicon wafers can achieve 5*9*2 (five rows, nine rows and two layers) a tot...

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Abstract

The invention relates to a coating device of a solar cell, and in particular relates to a bilayer coating device of a crystalline silicon solar cell. The bilayer coating device comprises a reaction chamber, a bilayer silicon wafer loading board, an upper air inlet, a lower air inlet, an air outlet, an upper plasma source and a lower plasma source, a vacuum pump and a heater. The bilayer coating device can simultaneously carry out preparation of an antireflection membrane on silicon wafers at the upper and lower layers so as to increase the yield, and is suitable for industrial production.

Description

technical field [0001] The invention relates to a coating device for a solar cell, in particular to a double-layer coating device for a crystalline silicon solar cell. Background technique [0002] Among all kinds of silicon solar cells, crystalline silicon cells have always occupied the most important position. In recent years, increasing device production capacity has always been the goal pursued by device developers. Plate coating equipment mainly relies on increasing the length and width of the reaction chamber to increase production capacity, but increasing the length and width of the reaction chamber will result in more bulky equipment, and a larger coating area will lead to more unstable uniformity between sheets, greatly increasing Equipment manufacturing difficulty and cost. Contents of the invention [0003] The purpose of the present invention is to solve the above problems and propose a double-layer coating equipment for crystalline silicon solar cells, which ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/44C23C16/455C23C16/458H01L31/18
CPCY02P70/50
Inventor 姜言森张春艳张丽丽杜敏孙继峰张黎明刘鹏李玉花程亮任现坤贾河顺徐振华李刚王兆光姚增辉张同星
Owner 山东力诺太阳能电力股份有限公司