Substrate for photomask, photomask, method for manufacturing photomask and method for transfering pattern

A manufacturing method and pattern transfer technology, which are used in microlithography exposure equipment, semiconductor/solid-state device manufacturing, optics, etc., can solve problems such as deterioration, color turbidity, and poor liquid crystal display devices, and achieve improved transfer accuracy. The effect of improving coordinate accuracy
CN102736402AActive Publication Date: 2012-10-17HOYA CORP
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
HOYA CORP
Publication Date
2012-10-17

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Abstract

The invention provides a substrate for a photomask, the photomask, a method for manufacturing the photomask and a method for transfering a pattern, and transferring precision of the pattern is improved in proximity exposure. The photomask is provided with: a transparent substrate; and a transferring pattern formed by composing a shading film formed at the surface of the transparent substrate to be a predetermined transferring pattern, wherein, a worktable using a depicting machine supports the second main surface of the transparent substrate from the lower part; and the transferring pattern is formed, for the flatness of the second main surface of the transparent surface when no supporting part is sued to support the transparent substrate from the lower part, when the height difference between each arbitrary two points, is disposed to be Delta Zb([mu]m), Delta Zb<=(1 / T)*3.0.
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Description

Technical field

[0001] The present invention relates to a substrate for a photomask, a photomask, a method for manufacturing a photomask, and a pattern transfer method. Background technique

[0002] A liquid crystal display device such as a computer or a portable terminal has the following structure: a TFT substrate (hereinafter also referred to as TFT) on which a TFT (thin film transistor) array is formed on a light-transmitting substrate and a transparent substrate Color filters with RGB patterns formed on them are pasted together, and liquid crystals are sealed between them. The color filter (hereinafter also referred to as CF) is manufactured by sequentially implementing the following steps: forming a black matrix layer constituting a color boundary on one main surface of a translucent substrate; A step of forming color filter layers (hereinafter also referred to as color layers) such as a red filter layer, a green filter layer, and a blue filter layer on one main surface of...

Claims

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