The utility model discloses a kind of special substrate photoetching
machine processing device, it is related to photoetching substrate material
processing technical field, including operation platform, cleaning mechanism is fixedly connected in operation platform upper portion, and fine adjustment mechanism is fixedly connected in operation platform upper portion, fine adjustment mechanism is located cleaning mechanism side face.The utility model, through the real-time closed-loop
feedback control system formed by
pressure sensor and second
servo motor, when detecting that pressure is below threshold value, second
servo motor rapidly drives cleaning head to slightly descend, ensure that enough peeling force is exerted to superhard particle, thoroughly remove adhered contaminant, avoid the scratch of
mask plate or pattern transfer deviation in subsequent photoetching process due to residual particle, when pressure is close to threshold value upper limit, immediately drive cleaning head to slightly lift, accurately avoid scratch on
diamond surface due to excessive pressure, protect its
crystal structure integrity, maintain excellent heat conduction and insulating performance.