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Magnetic levitation balance mass framework

A technology of balanced mass and magnetic levitation, which is applied in the direction of photolithographic exposure device, non-rotational vibration suppression, microlithography exposure equipment, etc., to achieve the effect of small interference, simple structure and reduced energy consumption

Active Publication Date: 2014-04-09
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to solve the problems existing in the existing balance mass frame, the present invention proposes a novel magnetic levitation balance mass frame

Method used

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  • Magnetic levitation balance mass framework
  • Magnetic levitation balance mass framework
  • Magnetic levitation balance mass framework

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Experimental program
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Effect test

specific Embodiment approach 1

[0020] Embodiment 1: The magnetic levitation balance mass frame described in this embodiment includes a base frame 1, a balance mass frame 2, four magnetic levitation support units 3, a pair of magnetic recovery mechanisms 4 and a pair of electromagnetic dampers 5;

[0021] The basic frame 1 is a planar rectangular frame structure, and the four corners of the upper surface of the frame structure are respectively provided with four stators 3-1 of the magnetic suspension support unit 3, and the stators 3-1 of the four magnetic suspension support units are all connected to the base frame. 1 fixed connection;

[0022] The balance mass frame 2 and the base frame 1 are arranged parallel to each other, and are located directly above the base frame, and the movers 3-3 of the four magnetic levitation support units are all fixedly connected to the balance mass frame 2;

[0023] The stators 4-1 of the two magnetic recovery mechanisms 4 forming a pair of magnetic recovery mechanisms 4 are...

specific Embodiment approach 2

[0027] Embodiment 2: This embodiment is a further limitation of the magnetic levitation balance mass frame described in Embodiment 1. In this embodiment, the magnetic levitation support unit 3 includes a stator and a mover, and the stator is fixed by a stator permanent magnet and a stator permanent magnet. The stator permanent magnet is pasted and fixed on the air gap side of the stator permanent magnet fixing plate. The stator permanent magnet is a flat-shaped permanent magnet magnetized in parallel, and the magnetization direction is perpendicular to the plane where the air gap adjacent to the stator permanent magnet is located. The mover is composed of a mover permanent magnet and a mover permanent magnet fixing plate, the mover permanent magnet is pasted and fixed on the air gap side of the mover permanent magnet fixing plate, and the mover permanent magnet is a flat plate permanent magnet magnetized in parallel. The magnetization direction of the permanent magnet of the mo...

specific Embodiment approach 3

[0028] Embodiment 3: This embodiment is a further limitation of the magnetic levitation balance mass frame described in Embodiment 1. In this embodiment, the magnetic recovery mechanism 4 includes an external excitation component and an internal excitation component, and the external excitation component is a cylinder Shaped structure, the inner excitation part is located inside the outer excitation part, and there is an air gap between the inner excitation part and the outer excitation part; a force repelling each other along the horizontal direction is generated between the outer excitation part and the inner excitation part.

[0029] In this embodiment, the external excitation component is a cylindrical structure, generally a rectangular cylindrical structure.

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Abstract

The invention relates to a balance mass framework, solves the problems of the conventional balance mass framework, and provides a magnetic levitation balance mass framework. A basic framework of the magnetic levitation balance mass framework is a planar rectangular framework structure; stators of four magnetic levitation supporting units are respectively arranged at four corners of the upper surface of the framework structure; the balance mass framework is positioned right above the basic framework and fixedly connected with rotors of the four magnetic levitation supporting units; stators of two magnetic recovery mechanisms forming a pair of magnetic recovery mechanisms are fixedly mounted on two opposite edges of the basic framework respectively; stators of two electromagnetic dampers forming a pair of electromagnetic dampers are fixedly mounted on two opposite edges of the basic framework respectively; a rotor of each magnetic recovery mechanism is fixedly connected with the balance mass framework; and a rotor of each electromagnetic damper is fixedly connected with the balance mass framework. The magnetic levitation balance mass framework is applicable to vacuum environments.

Description

technical field [0001] The present invention relates to a balance mass frame. Background technique [0002] In the lithography machine workpiece table, in order to improve the motion control accuracy and reduce the impact and vibration, the balance mass frame is usually used to buffer the reaction force generated by the high-speed motion of the linear motor, and the balance mass frame generally adopts static pressure air floatation. When the balance mass frame deviates from the equilibrium position, it is necessary to use a recovery mechanism to bring the balance mass frame back to the balance position, especially when there is a high-frequency force acting on the balance mass frame, since the balance mass frame itself has small damping, an external damping force is required to The vibration of the balance mass frame is quickly attenuated to ensure the stability of the system. The traditional recovery mechanism and the generation of damping force are generally implemented b...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): F16F15/03F16F15/22G03F7/20
Inventor 寇宝泉张赫张鲁罗俊
Owner HARBIN INST OF TECH