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Ion beam automatic measuring system and method

An automatic measurement, ion beam technology, applied in measurement devices, radiation measurement, X / γ / cosmic radiation measurement and other directions, can solve the problem of large loss of ion source and parameter measurement device, affecting the stability of the ion source system, laborious and other problems , to achieve the effect of being conducive to maintenance, saving measurement time and improving reliability

Active Publication Date: 2012-12-12
HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This measurement method, due to the need for multiple installation and disassembly, shutdown and start-up of the ion source system, is time-consuming, laborious, and has a large loss on the ion source and parameter measurement devices, and at the same time affects the stability of the ion source system

Method used

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  • Ion beam automatic measuring system and method
  • Ion beam automatic measuring system and method
  • Ion beam automatic measuring system and method

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Embodiment Construction

[0027] Such as figure 1 As shown, an ion beam automatic measurement system according to an embodiment of the present invention includes: an ion source system 1, an interface flange 2, a vacuum chamber 3, a beam intensity measurement probe 4, an emissivity measurement probe 5, and an energy divergence measurement probe 6 , monoatomic ion ratio measuring probe 7, beam cut-off device 8, first stepper motor driver 9, second stepper motor driver 16, first stepper motor 10, second stepper motor 12, third step Advance motor 17, the 4th stepper motor 21, the first scanning electric field power supply 14, the second scanning electric field power supply 19, scanning magnetic field power supply 23, the first A / D card 11, the second A / D card 15, the third A / D card D card 20, the 4th A / D card 24, the 5th A / D card 25, the first D / A card 13, the second D / A card 18, the 3rd D / A card 22 and computer 26; Ion beam current After being drawn out from the ion source system 1, the interface flange ...

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Abstract

The invention discloses an ion beam automatic measuring system and method. Measurement probes for four parameters (beam intensity, emittance, energy divergence and monatomic ion ratio) of an ion beam are organically integrated in a vacuum chamber and are used for measuring beam intensity, emittance, energy divergence and monatomic ion ratio. The measurement probes for the four parameters are movable and are driven by a step motor, the operation of the step motor, and the acquisition and processing of measurement data are controlled by a computer. The invention has the advantages that all parameters of the ion beam can be measured under the state that an ion source stably operates without halting, assembly and disassembly procedures of all parameter measurement devices are reduced, damage to the ion source and the parameter measurement devices is reduced, and the convenience and the rapidness are achieved in a measurement process, and the influence of an environment factor is lowered, and the precision of parameter measurement is improved.

Description

technical field [0001] The invention relates to an ion beam current automatic measurement system and a measurement method, which relate to the fields of ion source, beam optics, ion implantation technology, particle accelerator, nuclear energy and the like. Background technique [0002] For the ion beam, it is very important to measure its beam intensity, emittance, energy spread and monatomic ion ratio. In the research of ion source, these parameters of ion beam directly reflect the performance of ion source. Ion implantation technology uses an ion beam with an energy of 100keV to enter the material. A series of physical and chemical interactions will occur between the ion beam and the atoms or molecules in the material. The incident ions gradually lose energy and finally stay in the material. In, and cause changes in the surface composition, structure and properties of the material, thereby optimizing the surface properties of the material, or obtaining some new excellent...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01T1/29
Inventor 陈学勇宋逢泉祝庆军廖燕飞宋钢
Owner HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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