Photomask clamp of photomask box

Abstract

The invention aims at providing a photomask clamper of photomask box. The photomask clamper of the photomask box is used for storing or transporting photomask substrates in the photomask box. The photomask clamper is disposed in the photomask box firmly and is capable of not contacting with a photomask face. And the photomask clamp can prevent the generation of static electricity caused by the damges or shifts of the photomask. The photomask clamper of the photomask box provided by the invention includes resin substrates mixed with carbon. The resin substrates are arranged in the four corners on the inner surface of the photomask box. The substrates are provided with branch parts through bending arms. The branch parts are provided with projection parts in the direction of the upper surface and inclination face arranged on one sides of the projection parts. The photomask is carried on the branch parts by the inclination faces through edge lines of the photomask. And the bending arms bend downward, thereby retaining the photomask with elastic forces.

Description

technical field [0001] The present invention is a box for storing or transporting photomask substrates used for manufacturing semiconductor elements or liquid crystal display elements, etc., and relates to a photomask locking tool for a photomask box which can be securely placed in the box , and does not touch the mask surface, that is, the surface provided with the mask pattern or the surface before patterning, which can prevent the damage of the mask or the generation of static electricity caused by offset. Background technique [0002] Conventionally, with regard to the photomask substrates used in the manufacturing steps of semiconductor integrated circuits, for example, the photolithography steps used in the manufacturing of semiconductor elements or liquid crystal display elements, etc., the contamination of the substrate surface is extremely repelled. , and the main purpose of using the pod for storing the photomask substrate when storing or transporting the photomask...

AI Technical Summary

Problems solved by technology

[0008] Therefore, it is very useful in this point to prevent the generation of harmful gases and maintain a reasonable value (E3~9Ω) of the conductive volume resistivity by using carbon to impart conductivity through a polycarbonate-based resin, but on the contrary The amount of carbon mixed in increases, and the pod, especially the locking part in contact with the photomask substrate, becomes brittle, resulting in the generation of particles, etc.

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