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Illumination system of a microlithographic projection exposure apparatus

A lighting system and microlithography technology, applied in the field of lighting systems, can solve problems such as increasing the flexibility of variable irradiance distribution

Active Publication Date: 2015-04-22
CARL ZEISS SMT GMBH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0015] Even with the additional flexibility provided by displaceable optics such as zoom lenses and turning mirror assemblies, there is still a need for increased flexibility to produce continuously variable irradiance distribution in the pupil plane

Method used

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  • Illumination system of a microlithographic projection exposure apparatus
  • Illumination system of a microlithographic projection exposure apparatus
  • Illumination system of a microlithographic projection exposure apparatus

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no. 2 example

[0135] Figure 7 is similar to figure 2 , showing a meridional sectional view of the lighting system 12 according to the second embodiment.

[0136] Figure 7 Illumination system 12 shown with figure 2 The illumination systems shown differ primarily in that the first and second drives 54 , 64 are configured to displace the diffractive optical elements 42 , 44 not only in the X direction but also in the Y direction. The X and Y directions are orthogonal to each other but do not include the optical axis OA.

[0137] For this purpose, the drive 54 , 64 comprises an additional servomotor 114 , 116 capable of displacing the first and second diffractive optical element 42 , 44 in the Y direction, as well as the servomotor 56 , 66 and the gear transmission 58 , 68 .

[0138] The following will refer to Figure 8a , 8b and 8c illustrate the effect of displacing the first and second diffractive optical elements 42, 44 also along the Y direction.

[0139] Figure 8a essentiall...

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Abstract

An illumination system of a microlithographic projection exposure apparatus includes a light source to produce projection light beam, and a first and a second diffractive optical element between the light source and a pupil plane of the illumination system. The diffractive effect produced by each diffractive optical element depends on the position of a light field that is irradiated by the projection light on the diffractive optical elements. A displacement mechanism changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism, the light field extends both over the first and the second diffractive optical element. This makes it possible to produce in a simple manner continuously variable illumination settings.

Description

technical field [0001] The present invention relates generally to illumination systems for illuminating masks in microlithographic exposure apparatuses, and more particularly to systems in which diffractive optical elements are used to define the irradiance distribution in the pupil plane. The invention also relates to a method of operating such a lighting system. Background technique [0002] Microlithography (also known as photolithography or simply photolithography) is a technique for fabricating integrated circuits, liquid crystal displays, and other microstructured devices. In conjunction with etching processes, microlithography processes are used to form patterned features in an already formed film stack on a substrate (eg, a silicon wafer). In each layer of fabrication, the wafer is first coated with photoresist, a material that is sensitive to radiation such as deep ultraviolet (DUV) light. Next, the wafer with photoresist on top is exposed to projection light in a...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70058G03F7/70125G03F7/70216G03F7/70691H01L21/0274G03F7/70158
Inventor M.帕特拉S.比林M.德冈瑟F.施莱森纳M.施瓦布
Owner CARL ZEISS SMT GMBH