Vacuum glass support pillar layout device

A technology of discharge device and vacuum glass, applied in the field of industrial discharge device, can solve the problems of high labor intensity, the discharge of vacuum glass support columns cannot meet the standard requirements, and the discharge efficiency of support columns is low, and achieves improved work efficiency and no hysteresis. , the effect of promoting the processing process

Active Publication Date: 2013-01-23
扬州智创企业运营管理服务有限公司
View PDF5 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

It solves the problems of low discharge efficiency of existing support columns, high labor intensity, and the discharge of vacuum glass support columns does not meet the standard requirements, etc.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Vacuum glass support pillar layout device
  • Vacuum glass support pillar layout device
  • Vacuum glass support pillar layout device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0021] In order to express the patent of the present invention more clearly, combined with the attached vacuum glass support column discharge device figure 1 , 2 , 3 to further explain the patent of the present invention.

[0022] A vacuum glass support column discharge device, which is composed of a base 1, a column 2, a y-axis guide rail 18, an x-axis guide rail 3, a z-axis guide rail 4, a workbench 17, a transmission mechanism, a shearing mechanism, etc., and the y-axis guide rail 18 is set On the base, a workbench 17 is arranged on the y-axis guide rail 18 , and a guide structure matching the y-axis guide rail 18 is provided on the bottom surface of the workbench 17 . The x-axis guide rail 3 and the z-axis guide rail 4 are installed and connected to the column 2 respectively, the transmission mechanism is installed and connected to the column 2 through the x-axis guide rail 3 and the z-axis guide rail 4 respectively, and the shearing mechanism is connected and fixed on th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a vacuum glass support pillar layout device which comprises a base and a stand column. The vacuum glass support pillar layout device is characterized by being provided with a y-axis guide rail, an x-axis guide rail, a z-axis guide rail, a workbench, a transmission mechanism and a shearing mechanism, wherein the y-axis guide rail is arranged on the base, the workbench is arranged on the y-axis guide rail, and the bottom of the workbench is provided with a guide structure matched with the y-axis guide rail; and the x-axis guide rail and the z-axis guide rail are respectively connected with the stand column, the transmission mechanism is connected with the stand column by the x-axis guide rail and the z-axis guide rail respectively, and the shearing mechanism is connected with and fixed on the transmission mechanism by a lateral suspension frame plate and is positioned above the workbench. The vacuum glass support pillar layout device is reasonable and compact in structure, has a good using effect, can meet the standard requirement on the layout positions of support pillars, and can be widely used in various layout occasions. A stepping motor can be used for realizing pause at a fixed point and fixed time and can avoid lagging. The vacuum glass support pillar layout device can be used for laying the support pillars while shearing copper wires to form the support pillars, so that the working efficiency is greatly improved, and the processing progress of vacuum glass is promoted.

Description

technical field [0001] The invention belongs to a novel industrial discharge device, in particular to a discharge device which is a vacuum glass support column. Background technique [0002] At present, the discharge of support columns in vacuum glass is basically done manually. The efficiency of manual discharge is low, the process is complicated, the labor intensity is high, and the position of the support column does not meet the standard requirements. The above deficiencies in manual discharge will affect the overall vacuum glass processing. process. In addition, with the continuous advancement of science and technology and the rapid development of industrial production, artificial discharge support columns are becoming less and less suitable for the needs of social development. Therefore, it has become an important task to invent and design a vacuum glass support column discharge device to realize its automation. The problem. Contents of the invention [0003] The p...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C03C27/06
Inventor 缪宏张瑞宏沈函孝张剑峰朱松金亦富郑再象王洪亮奚小波赵荔王红军
Owner 扬州智创企业运营管理服务有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products