Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Etching device

A technology for etching device and etching solution, which is applied to spray devices, spray devices, and devices for coating liquid on surfaces, etc., can solve problems such as uneven flow rate of etching solution, uneven etching of curved glass, and inconsistent residence time.

Active Publication Date: 2013-02-13
SHENZHENSHI YUZHAN PRECISION TECH CO LTD
View PDF6 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the above-mentioned etching device is only suitable for etching flat glass. If it is necessary to etch curved glass, the flow rate of the etching solution will be uneven due to the irregular change of the curvature of the curved glass side, and the residence time of the etching solution on the surface of the curved glass will be inconsistent. Uneven glass etching

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Etching device
  • Etching device
  • Etching device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0012] see figure 1 , the etching device 100 is used to etch the surface of the curved glass 200 , the etching device 100 includes a substrate 10 , a liquid storage part 30 , an air compressor 40 and a rotating part 50 . The liquid storage part 30 is used for containing the etching liquid, and it is connected with the air compressor 40 to spray the etching liquid from the liquid storage part 30 . The rotating member 50 is rotatably mounted on the base 10 and adjacent to the liquid storage member 30 . The curved glass 200 is fixedly installed on the rotating part 50 , and the etching solution sprayed from the liquid storage part 30 can be sprayed onto the surface of the curved glass 200 to etch the curved glass 200 .

[0013] Please also see figure 2 and image 3 , the base body 10 is used to install the liquid storage part 30 and the rotating part 50, and in the embodiment of the present invention, the base body 10 is disc-shaped. The base body 10 defines a first installa...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

An etching device comprises a basal body and a liquid storing member, wherein the liquid storing member is arranged on the basal body and is provided with accommodation holes for accommodating an etching liquid; the side surface of the liquid storing member is provided with injection holes communicated with the accommodation holes, and the etching liquid is injected from the injection holes; and the etching device also comprises rotation members arranged on the basal body, and the rotation members are arranged opposite to the side surface of the liquid storing member. The etching liquid can be injected to curved glass from all angles because the rotation members drive the curved glass to rotate when the curved glass is etched by the etching device, so the curved glass is uniformly etched by the etching liquid, thereby the non-uniform etching caused by the non-uniform flow velocity of the etching liquid because of the irregular surface of the curved glass is avoided.

Description

technical field [0001] The invention relates to an etching device, in particular to an etching device for etching glass. Background technique [0002] The glass processing process often involves etching the glass surface. Generally, the etching device includes a plurality of nozzles arranged side by side, and a plurality of pieces of glass are vertically and fixedly arranged side by side under the nozzles. During etching, the etchant flows to the bottom of the glass at a substantially uniform speed along the side of the glass. However, the above-mentioned etching device is only suitable for etching flat glass. If it is necessary to etch curved glass, the flow rate of the etching solution will be uneven due to the irregular change of the curvature of the curved glass side, and the residence time of the etching solution on the surface of the curved glass will be inconsistent. The glass is etched unevenly. Contents of the invention [0003] In view of the above, it is neces...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C03B15/00
CPCB05D1/00B05B1/00C03C15/00B05B13/0442B05B3/1007
Inventor 刘咸柱陈钜盛肖兴荣
Owner SHENZHENSHI YUZHAN PRECISION TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products