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Microtopological-structure plate flow chamber capable of applying electric and shearing force stimulation

A technology of flat flow cavity and topology structure, applied in the field of flat flow cavity, to achieve the effect of simple and compact structure

Active Publication Date: 2013-02-20
CHONGQING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there is no flow chamber that can control the microtopography while applying electrical and shear force stimulation to the cells.

Method used

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  • Microtopological-structure plate flow chamber capable of applying electric and shearing force stimulation
  • Microtopological-structure plate flow chamber capable of applying electric and shearing force stimulation
  • Microtopological-structure plate flow chamber capable of applying electric and shearing force stimulation

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Depend on figure 1 , figure 2 , image 3 and Figure 4 It can be seen that the flat plate flow chamber that can implement multi-directional electrical stimulation of the present invention is composed of three layers of flat plates and two layers of gaskets. A rectangular slit 6 is provided, and the lower gasket 10 is provided with a flow cell 18 . Both the width and length of the flow cell 18 should be substantially greater than the difference between the thickness of the flow cell 18 and the thickness of the electrode plate 16 placed therein. The upper plate 2, the middle plate 5 and the lower plate 11 can be made of polycarbonate, Plexiglas or metal, and the upper gasket 3 and the lower gasket 10 can be made of silicone resin or the like. like Figure 5 , Image 6 and Figure 7 It can be seen that the culture solution enters the triangular diversion groove 4 in the upper gasket 3 from the upper conduit 1 of the upper plate 2, so that the fluid is fully dispers...

Embodiment 2

[0045] The micro-topology structure on the electrode plate 16 of the present invention is not limited to the micro-grooves provided in Embodiment 1, and micro-bosses of various shapes such as triangles, quadrilaterals, pentagons, hexagons or cylinders can also be formed on the silicon wafer array. Take the square boss as an example, Figure 10 is the top view of the electrode plate on the bottom of the flow cell with a flat flow cavity with microtopology that can be stimulated by electrical and shear forces, Figure 11 Yes Figure 10 Electrode plates along the bottom of a flow cell with a flat flow chamber with microtopology that can be stimulated by electrical and shear forces are shown. Figure 10 Sectional view of line E-E in . In order to obtain the electrode plate as shown in the figure, a square micro-protrusion array can be formed on the silicon wafer first. Other regular or irregular patterns of micro-boss arrays can also be formed according to this method. The ot...

Embodiment 3

[0047] The electrode plate 16 of the present invention can be prepared into a flat plate with a uniform thickness to achieve uniform fluid shearing force. The electrode plate 16 can also be prepared as a wedge-shaped plate with a uniform thickness to achieve continuous shear force action. Figure 12 is a cross-sectional view of the electrode plate 16 whose thickness varies uniformly, Figure 13 Yes Figure 12 A side view of the bottom electrode plate 16 is shown. When preparing the electrode plate 16 with uniform thickness, the thickness of the PDMS film 23 can be kept uniform, and the sheet 22 can be made into a wedge shape with an inclination of 5-60°, or the thickness of the sheet 22 can be kept uniform, and the PDMS film 23 can be made 5-60° Wedge of inclination. In order to facilitate processing, it is preferable to keep the thickness of the PDMS film 23 uniform, and the sheet 22 is made into a wedge shape with an inclination of 5-60°. Other methods and structures are...

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Abstract

The invention discloses a microtopological-structure plate flow chamber capable of applying electric and shearing force stimulation, which is formed by superposing three plates and two gaskets, wherein an upper plate (2) is provided with a fluid inlet / outlet port; an upper gasket (3) is provided with a diversion trench (4); a middle plate (5) is provided with a rectangular slit (6); a lower gasket (10) is provided with a flow cavity (18); the middle plate (5) above the flow cavity (18) is provided with a plate electrode (7); a lower plate (11) below the flow cavity (18) is provided with a plate electrode (16); a pair of electrodes (14 and 17) are respectively arranged on four sides of the flow cavity (18); and the plate electrode (16) is composed of a sheet (22), a PDMS (polydimethylsiloxane) film (23) and a graphene film (24), and has a microtopological structure on the surface. When applying electric and shearing force stimulation with different modes and intensities, the invention implements microtopological structure regulation on the cell (19). The structure of the device is simple, compact and reliable.

Description

technical field [0001] The invention relates to a flat plate flow chamber, in particular to a flat plate flow chamber with a micro-topology structure that can be stimulated by electrical and shear forces. Background technique [0002] Tissue engineering is based on the principles of cell biology and engineering, combining seed cells, bioscaffold materials and growth factors to construct tissues and organs in vitro / in vivo to maintain, repair, regenerate or improve the function of damaged tissues and organs. Bioscaffold materials for composite seed cells are the core of tissue engineering. Numerous studies have shown that matrix microtopology, electrical stimulation and shear force can regulate biological functions such as cell adhesion, proliferation, and differentiation, and can promote seed cells to interact with each other. Interaction of scaffold materials to regulate secretion of extracellular matrix in cells. Currently in tissue engineering, only one stimulation modal...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C12M1/42
CPCC12M23/12C12M23/20C12M21/08C12M35/02C12M23/04
Inventor 吕永钢董单娟邹杨
Owner CHONGQING UNIV
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