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Mg/Mo/SiC extreme ultraviolet multilayer film reflector and manufacturing method thereof

A production method and multi-layer film technology, applied in the direction of chemical instruments and methods, mirrors, layered products, etc., can solve the problems of not meeting broadband reflectivity, narrow effective bandwidth, etc., to achieve widening bandwidth, improving reflectivity, reducing The effect of the number of cycles

Inactive Publication Date: 2013-03-06
TONGJI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the effective bandwidth (full width at half maximum) of the Mg-based multilayer reflective element is narrow, below 1.7 nm, which cannot meet the broadband reflectivity requirements of some special applications in extreme ultraviolet optics.

Method used

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  • Mg/Mo/SiC extreme ultraviolet multilayer film reflector and manufacturing method thereof
  • Mg/Mo/SiC extreme ultraviolet multilayer film reflector and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] The manufacturing method of Mg / Mo / SiC extreme ultraviolet multilayer mirror, such as figure 1 As shown, first, ultra-smooth single crystal silicon wafers (crystal orientation of (100)) or glass are selected as the substrate 1 of the reflector, and the substrate roughness is 0.3-0.5 nm. Then, a SiC film with a thickness of 2-3 nanometers is plated on the substrate as a primer layer 2. Then the Mg film layer 3, Mo film layer 4 and SiC film layer 5 are repeatedly plated on the bottom layer 2 to form a Mg / Mo / SiC periodic multilayer film 6, the number of cycles is 30-40, the thickness of Mg and the thickness of the cycle The ratio is 0.7-0.8, and the ratio of the Mo film layer to the periodic thickness is 0.07-0.1. In the periodic multilayer film 6, the first layer plated in each cycle is a Mg layer, the second layer is a Mo layer, and the last layer is a SiC layer. After 30-40 cycles of plating, excellent performance can be obtained Mg / Mo / SiC extreme ultraviolet multilayer ...

Embodiment 2

[0027] Mg / Mo / SiC extreme ultraviolet multilayer film reflector, the reflector is composed of (100) silicon wafer as the substrate, the bottom layer and the Mg / Mo / SiC periodic multilayer film, the bottom layer is a thickness of 2 nanometers SiC is plated on the substrate, and the Mg / Mo / SiC periodic multilayer film is plated on the bottom layer. The first layer plated from bottom to top in each cycle is the Mg film layer, and the second layer is the Mo film layer. The last layer is the SiC film, the number of cycles is 30, the total thickness of the Mg / Mo / SiC multilayer film is 450 nanometers, of which the thickness of the Mg film is 9 nanometers, the thickness of the Mo film is 1 nanometer; the SiC film The thickness is 3 nanometers.

[0028] The manufacturing method of Mg / Mo / SiC extreme ultraviolet multilayer mirror includes the following steps:

[0029] 1) SiC with a thickness of 2 nanometers is plated on a super smooth silicon wafer or glass substrate with a crystal orientation ...

Embodiment 3

[0032] Mg / Mo / SiC extreme ultraviolet multilayer mirror. The mirror is composed of a glass substrate, a bottom layer and a periodic Mg / Mo / SiC multilayer film. The bottom layer is SiC with a thickness of 3 nanometers, which is plated on the substrate. / Mo / SiC periodic multilayer film is plated on the bottom layer, the first layer plated from bottom to top in each cycle is the Mg film layer, the second layer is the Mo film layer, and the last layer is the SiC film layer. The number is 40, the total thickness of the Mg / Mo / SiC multilayer film is 640 nanometers, among which the thickness of the Mg film layer is 11 nanometers, the thickness of the Mo film layer is 1.5 nanometers, and the thickness of the SiC film layer is 4.5 nanometers.

[0033] The manufacturing method of Mg / Mo / SiC extreme ultraviolet multilayer mirror includes the following steps:

[0034] 1) SiC with a thickness of 3 nanometers is plated on an ultra-smooth silicon wafer or glass substrate with a crystal orientation of...

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Abstract

The invention relates to an Mg / Mo / SiC extreme ultraviolet multilayer film reflector and a manufacturing method thereof. The manufacturing method of the Mg / Mo / SiC extreme ultraviolet multilayer film reflector comprises the following steps of: plating and manufacturing a priming layer on a super smooth silicon sheet or glass substrate; secondly, alternatively plating and manufacturing MG, Mo and SiC film layers to form a Mg / Mo / SiC periodic multilayer film; and finally, plating and manufacturing SiC as a protection layer. With the adoption of the manufacturing method of the Mg / Mo / SiC extreme ultraviolet multilayer film reflector provided by the invention, metal Mo with a high melting point and a stable phase state is added into the multilayer film Mg / SiC; the extreme ultraviolet multilayer film reflector made of three materials is manufactured; and the defect that the bandwidth of the traditional Mg-based multilayer film made of a material, such as Mg / SiC and the like, is narrow can be overcome. Meanwhile, the optical constant of an extreme ultrasonic waveband Mo is suitable; and the Mg / Mo / SiC extreme ultraviolet multilayer film reflector keeps the high reflectivity of the Mg-based multilayer film reflector. Therefore, the optical properties on aspects of the reflectivity and the working bandwidth can be considered by the Mg / Mo / SiC extreme ultraviolet multilayer film reflector. The Mg / Mo / SiC ultraviolet multilayer film reflector is particularly applicable to extreme ultraviolet band application in fields such as a synchronous radiation light source, ultrafast laser, space observation and the like.

Description

Technical field [0001] The invention belongs to the field of manufacturing precision optical elements, and in particular relates to a broadband multilayer mirror with three materials using Mg as a spacer layer applied to the extreme ultraviolet band and a manufacturing method thereof. Background technique [0002] According to the Rayleigh criterion, it can distinguish the radius of the Airy disk corresponding to the distance between two equal brightness points, that is, when the center of the diffraction pattern of one point coincides with the first dark ring of the diffraction pattern of another point, exactly two points can Distinguish the boundaries. That is, for an optical system with a fixed size, the smaller the working wavelength, the stronger the system's ability to distinguish small objects. Therefore, optical instruments and systems working in the extreme ultraviolet band can observe even more minute material structures and distinguish finer material states. In the e...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/08G02B1/10B32B9/04B32B15/00
Inventor 朱京涛周斯卡李浩川王占山
Owner TONGJI UNIV
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