A kind of flexible substrate nano-diamond film and preparation method thereof
A nano-diamond and flexible substrate technology, applied in the field of polishing and abrasive materials, can solve the problems of low bonding force between the diamond film and the substrate, complex production and preparation processes, etc., achieve strong controllability and versatility, and improve the nucleation rate. , the effect of the simple method
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[0025] Embodiment 1 A kind of preparation method of flexible substrate nano-diamond film:
[0026] (1) Substrate copper foil (10×10×0.2mm) is surface treated, and the treatment process is: polishing → ultrasonic cleaning in acetone solution for 10 minutes → deionized water cleaning for 5 minutes → soaking in 10% dilute sulfuric acid for 10 hours → acetone solution Ultrasonic cleaning for 10 minutes → deionized water cleaning for 2 minutes;
[0027] (2) Preparation of transition layer: C-S magnetron sputtering was used for the preparation of Ni transition layer. The specific conditions for sputtering deposition were as follows: sputtering current 0.9A, sputtering temperature 310°C, sputtering deposition time 18min, Ar gas flow 38sccm, during the entire sputtering process, the sample holder rotates continuously to make the film layer uniform;
[0028] (3) The sample obtained in step 2 was ultrasonically cleaned with diamond micropowder acetone solution for 10 minutes, ultrasoni...
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