Self-packaged MEMS (micro-electro-mechanical systems) device and infrared sensor
An infrared sensor, self-encapsulation technology, applied in the direction of piezoelectric devices/electrostrictive devices, piezoelectric/electrostrictive/magnetostrictive devices, instruments, etc., can solve the problem of high packaging requirements, to avoid the packaging process, Large commercial value and the effect of low market and process difficulty
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[0037] The present invention will be described in detail below through specific embodiments and accompanying drawings.
[0038] The infrared chip self-packaging method of the present invention can be applied to MEMS device chips with movable structures processed by surface sacrificial layer integration technology, such as infrared sensors, accelerometers, gyroscopes and other sensors, and actuators such as adjustable capacitance structures. Taking the production of polysilicon / gold dual-material cantilever infrared sensor as an example, the interconnection structure of the capacitive readout method is adopted. The specific process flow is shown in Figure 3, and its description is as follows:
[0039] 1. Preparation sheet: the monocrystalline silicon substrate is used as the substrate 1 of the chip;
[0040] 2. Deposit substrate protection layer, including: LPCVD SiO 2 , with a thickness of 3000 That is, the silicon oxide layer 2 in Figure 3(a) is formed; LPCVD Si 3 N 4 , ...
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