Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Preparation method of low polished cerium oxide polishing powder

A technology of cerium oxide and polishing powder, applied in chemical instruments and methods, inorganic chemistry, other chemical processes, etc., can solve the problems of high finish and stable aperture of optical components at the same time, and achieve low production cost and high finish aperture , The effect of the simple preparation method

Inactive Publication Date: 2013-06-05
XIAN SICONG FINE CHEM
View PDF3 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to overcome the above-mentioned defects in the prior art, the object of the present invention is to provide a method for preparing low-polish cerium oxide polishing powder, so as to effectively solve the problem that the existing cerium-based abrasive materials cannot satisfy the high finish and stable aperture of optical elements at the same time. question

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method of low polished cerium oxide polishing powder
  • Preparation method of low polished cerium oxide polishing powder
  • Preparation method of low polished cerium oxide polishing powder

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] A preparation method of low throw cerium oxide polishing powder, the concrete steps are as follows:

[0030] (1) First add 6.4L of 3N5 cerium nitrate solution with a concentration of 230g / L into a 25L reaction kettle, start stirring, and control the speed at 100-150R / min;

[0031] (2) Put 44 grams of cerium oxalate material into the reactor, start to heat up the material in the reactor, and keep the temperature of the material at 45-60°C;

[0032] (3) Add oxalic acid solution with a concentration of 250g / L to the material in step (2) dropwise at a constant speed at 45-60°C. The amount of oxalic acid solution added accounts for 110% of the total rare earth REO, and the time for adding oxalic acid solution is controlled at 30-45 Within minutes, continue to stir for 20-45 minutes after the oxalic acid solution is added dropwise to obtain the required cerium oxalate precipitate;

[0033] (4) After stopping the stirring, let the cerium oxalate precursor precipitate and stan...

Embodiment 2

[0037] A preparation method of low throw cerium oxide polishing powder, the concrete steps are as follows:

[0038] (1) Add 6.4L of 3N5 cerium nitrate solution with a concentration of 150g / L into a 25L reactor, start stirring, and control the speed at 100-150R / min;

[0039] (2) Put 30 grams of cerium oxalate material into the reactor, start to heat up the material in the reactor, and keep the temperature of the material at 50-60°C;

[0040] (3) Add oxalic acid solution with a concentration of 250g / L to the material in step (2) at a constant speed at 50-60°C. The amount of oxalic acid solution added accounts for 110% of the total rare earth REO, and the time for adding oxalic acid solution is controlled at 35-45 Within minutes, continue to stir for 25-40 minutes after the oxalic acid solution is added dropwise to obtain the required cerium oxalate precipitate;

[0041] (4) After stopping the stirring, let the cerium oxalate precursor precipitate and stand for 20-30 minutes, th...

Embodiment 3

[0045] A preparation method of low throw cerium oxide polishing powder, the concrete steps are as follows:

[0046] (1) Add 6.4L of 3N5 cerium nitrate solution with a concentration of 150g / L into a 25L reactor, start stirring, and control the speed at 100-150R / min;

[0047] (2) Put 38 grams of cerium oxalate material into the reactor, start to heat up the material in the reactor, and keep the temperature of the material at 50-60°C;

[0048] (3) Add oxalic acid solution with a concentration of 165g / L to the material in step (2) dropwise at a constant speed at 50-60°C. The amount of oxalic acid solution added accounts for 110% of the total rare earth REO, and the time for adding oxalic acid solution is controlled at 35-40 Within minutes, continue to stir for 25-35 minutes after the oxalic acid solution is added dropwise to obtain the desired cerium oxalate precipitate;

[0049] (4) After stopping the stirring, first precipitate the cerium oxalate precursor and continue to stand...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a preparation method of a low polished cerium oxide polishing powder, which comprises the following steps: adding a cerium nitrate solution in a reaction vessel, under stirring condition, adding a certain amount of cerous oxalate, then heating the materials in the reaction vessel, keeping the material temperature of 45-60 DEG C, adding an oxalate solution at the temperature, after finishing the dropping of the oxalic acid liquid, continuously stirring for 20-45 minutes, stopping the stirring , depositing a cerous oxalate precursor and standing for 15-30 minutes, washing to the pH value of 6.5-7.0, spin-drying on the sediment to form a loosely granular cerous oxalate material; then insulating the spin-dried cerous oxalate material, cooling, and sieving to remove the impurities to obtain the cerium oxide polishing powder with average particle size at 7-10mum and maximum particle size controlled in 30 mum, The oxalic acid is used for depositing high purity cerium nitrate as the precursor, the preparation method is simple, the production cost is low, and the obtained polishing powder has the effect of high fineness and stable aperture of an optical element.

Description

technical field [0001] The invention belongs to the technical field of cerium-based abrasive preparation, and in particular relates to a preparation method of cerium oxide polishing powder with oxalic acid precipitated high-purity cerium nitrate as a precursor. Background technique [0002] Cerium-based abrasives are widely used for grinding various glass materials, especially with the continuous growth of the types and quantities of electronic products, the application field of cerium-based abrasives has also been greatly expanded, which is used for grinding various glass materials, such as Grinding of glass such as window glass, display panel and optical instrumentation. [0003] The cerium-based abrasives currently on the market are usually made of carbonates of cerium-based rare earths, and another type of fluorine-containing cerium-based abrasives made of carbonates of cerium-based rare earths is mainly used for grinding high-throwing equipment. However, for the glass ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C01F17/00C09K3/14
Inventor 李勇侯社峰
Owner XIAN SICONG FINE CHEM
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com