The invention discloses preparation of a high-uniformity
cerium oxide abrasive material and application of the high-uniformity
cerium oxide abrasive material in a chemical mechanical
polishing solution. According to a method,
cerium nitrate or
cerium oxalate is used as a cerium source, a cationic or
nonionic surfactant is used as a structure-directing agent, and the high-uniformity
cerium oxide abrasive material is prepared in a mixed
solvent system formed by water and isopropanol or water and
diethylene glycol according to a
specific volume ratio. The preparation method comprises the following steps: regulating the particle size and the morphology structure through a
solvothermal reaction, carrying out cleaning,
drying and high-temperature
calcination treatment on a
reaction product to obtain sphere-like
cerium oxide nano-particles with high particle size
concentration ratio, moderate
surface roughness and good
dispersity, adding
cerium oxide powder into deionized water, and carrying out
ultrasonic dispersion to obtain the spherical cerium
oxide nano-particles. And sequentially adding a dispersing agent and
amino acid while stirring, uniformly stirring, fixing the volume, and adding a pH
regulator to enable the solution to be weakly acidic, thereby obtaining the chemical mechanical
polishing solution. The cerium oxide submicron
powder which is different in surface appearance, particle size and
distribution uniformity is prepared by adjusting the
solvent ratio and other
reaction conditions.