The application discloses a method for rapidly preparing
silicon-modified multi-level hole nano gamma-Al2O3, and specifically comprises the following steps: dissolving NaAlO2 in water to form a
sodium metaaluminate solution; dissolving a precipitant in water to form a solution, and transferring the solution into a reaction kettle; adding a
silicon source into the reaction kettle, wherein the adding amount of the
silicon source is calculated according to the adding amount of SiO2; slowly adding the
sodium metaaluminate solution into the reaction kettle, and adjusting the pH value of the obtained
mixed solution to 9-11; adding a pore-expanding aid, and aging for 3-10 hours; after aging, performing
solid-liquid separation, recycling the filtrate, sufficiently washing the
powder with deionized water, and
drying to obtain basic aluminum
ammonium carbonate; and calcining the AACH in a
muffle furnace at a temperature increasing rate of 2 DEG C / min to 300-500 DEG C to obtain silicon-modified nano gamma-Al2O3
powder. The nano gamma-Al2O3 prepared by the method can directly hydrothermally synthesize a silicon-modified precursor AACH in one step without other complex steps, has less impurities, and has high purity. The prepared nano gamma-Al2O3 has high specific surface area,
large pore diameter and high pore volume.