A producing process for preparing cerium oxide polishing powder

Abstract

The invention relates to the technical field of chemical production and particularly relates to a producing process for preparing cerium oxide polishing powder. Producing processes at present for cerium oxide polishing powder have disadvantages that: the environment is polluted; energy resources are wasted; and the polishing efficiency namely the cutting rate, polishing quality and service lifetime of the obtained cerium oxide polishing powder by the processes at present fail to meet requirements. The producing process adopts high-purity cerium oxide or cerous carbonate or cerous oxalate as a raw material, and by steps of heating, maintaining the temperature, performing secondary heating, performing secondary temperature maintaining, quenching, calcinating, removing water, drying, smashing and grading to obtain the polishing powder. A product of the producing process has advantages of high polishing speed, long service lifetime, good polishing quality, simple process, low raw material cost, energy conservation and environment protection.

Description

technical field

[0001] The invention relates to the technical field of chemical production, in particular to a production process for preparing cerium oxide polishing powder. Background technique

[0002] The application fields of rare earth polishing materials are constantly changing, from traditional TV picture tube glass bulb polishing, rhinestone polishing, etc. to high-performance polishing fields such as liquid crystal display more precise optical instruments and devices. From the perspective of development trend, the field of liquid crystal display and high-grade optical glass processing is the development direction of the application of rare earth polishing materials. High-grade polishing powder has high added value and high profit, and is closely related to the high-tech field with rapid development, so it has broad application prospects. At present, the development and production of high-performance rare earth polishing materials are mainly concentrated in Japan,...

Examples

Embodiment 1

[0038] With a purity of 99.95%, a particle size of 8-20μm, and a bulk density of 1.00-1.40g / cm 3 Cerium oxide is used as the raw material. After 120 minutes in the kiln, it is raised to 650°C and held for 80 minutes; then after 90 minutes, it is raised to 950°C and held for 150 minutes; the cerium oxide is quickly poured into cooling water at a temperature of 25°C, and it takes 0.5 min, complete quenching and calcination; dehydration and drying until the moisture content is less than 0.1%; crushing and grading to control the particle size from 2.4 μm to 2.6 μm; adding 0.4% polyethylene glycol 2000 by weight of polishing powder as a dispersant; packaging the finished product.

Embodiment 2

[0040] Using cerium carbonate with a purity of 99.95% as the raw material, heat it up to 650°C in the kiln for 180 minutes, and keep it for 120 minutes; In water, it took 0.5min to complete quenching and calcination; dehydration and drying until the moisture content was less than 0.1%; crushing and grading to control the particle size of 2.4μm-2.6μm; adding 0.5% of the weight of polishing powder polyethylene glycol 2000 as a dispersant; packaging the finished product.

Embodiment 3

[0042] Using cerium oxalate with a purity of 99.95% as the raw material, heat it to 650°C in the kiln for 110 minutes, and keep it for 90 minutes; In water, it took 0.5min to complete quenching and calcination; dehydration and drying until the moisture content was less than 0.1%; crushing and grading to control the particle size of 2.4μm-2.6μm; adding 0.7% of the weight of polishing powder polyethylene glycol 2000 as a dispersant; packaging the finished product.

technical field

[0001] The invention relates to the technical field of chemical production, in particular to a production process for preparing cerium oxide polishing powder. Background technique

[0002] The application fields of rare earth polishing materials are constantly changing, from traditional TV picture tube glass bulb polishing, rhinestone polishing, etc. to high-performance polishing fields such as liquid crystal display more precise optical instruments and devices. From the perspective of development trend, the field of liquid crystal display and high-grade optical glass processing is the development direction of the application of rare earth polishing materials. High-grade polishing powder has high added value and high profit, and is closely related to the high-tech field with rapid development, so it has broad application prospects. At present, the development and production of high-performance rare earth polishing materials are mainly concentrated in Japan,...

Examples

Embodiment 1

[0038] With a purity of 99.95%, a particle size of 8-20μm, and a bulk density of 1.00-1.40g / cm 3 Cerium oxide is used as the raw material. After 120 minutes in the kiln, it is raised to 650°C and held for 80 minutes; then after 90 minutes, it is raised to 950°C and held for 150 minutes; the cerium oxide is quickly poured into cooling water at a temperature of 25°C, and it takes 0.5 min, complete quenching and calcination; dehydration and drying until the moisture content is less than 0.1%; crushing and grading to control the particle size from 2.4 μm to 2.6 μm; adding 0.4% polyethylene glycol 2000 by weight of polishing powder as a dispersant; packaging the finished product.

Embodiment 2

[0040] Using cerium carbonate with a purity of 99.95% as the raw material, heat it up to 650°C in the kiln for 180 minutes, and keep it for 120 minutes; In water, it took 0.5min to complete quenching and calcination; dehydration and drying until the moisture content was less than 0.1%; crushing and grading to control the particle size of 2.4μm-2.6μm; adding 0.5% of the weight of polishing powder polyethylene glycol 2000 as a dispersant; packaging the finished product.

Embodiment 3

[0042] Using cerium oxalate with a purity of 99.95% as the raw material, heat it to 650°C in the kiln for 110 minutes, and keep it for 90 minutes; In water, it took 0.5min to complete quenching and calcination; dehydration and drying until the moisture content was less than 0.1%; crushing and grading to control the particle size of 2.4μm-2.6μm; adding 0.7% of the weight of polishing powder polyethylene glycol 2000 as a dispersant; packaging the finished product.

Images