Graphene-containing chemical mechanical polishing solution
A chemical mechanical and polishing liquid technology, applied in the field of polishing liquid, can solve the problems of low polishing rate and inability to take into account the polishing effect, and achieve the effect of low surface roughness
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Embodiment 1
[0041] This embodiment discloses a chemical mechanical polishing liquid, based on the total mass of the chemical mechanical polishing liquid, the chemical mechanical polishing liquid includes the following components and weight percentages:
[0042] Inorganic nanoparticles 20wt%
[0043] Chemical additives 0.5wt%
[0044] The balance is a pH regulator and water;
[0045] The inorganic nanoparticles include silicon dioxide and graphene; based on the total mass of the chemical mechanical polishing liquid, the mass percentage of the graphene is 1 wt%.
[0046] Specifically, the particle size of the graphene is 100-200 nm.
[0047] Specifically, the pH of the chemical mechanical polishing solution is 9.5.
Embodiment 2
[0049] This embodiment discloses a chemical mechanical polishing liquid, based on the total mass of the chemical mechanical polishing liquid, the chemical mechanical polishing liquid includes the following components and weight percentages:
[0050] Inorganic nanoparticles 30wt%
[0051] Chemical additives 2wt%
[0052] The balance is a pH regulator and water;
[0053] The inorganic nanoparticles include silicon dioxide and graphene; based on the total mass of the chemical mechanical polishing liquid, the mass percentage of the graphene is 5 wt%.
[0054] Specifically, the particle size of the graphene is 100-500 nm.
[0055] Specifically, the pH of the chemical mechanical polishing solution is 9.8.
Embodiment 3
[0057] This embodiment discloses a chemical mechanical polishing liquid, based on the total mass of the chemical mechanical polishing liquid, the chemical mechanical polishing liquid includes the following components and weight percentages:
[0058] Inorganic nanoparticles 40wt%
[0059] Chemical additives 5wt%
[0060] The balance is a pH regulator and water;
[0061] The inorganic nanoparticles include silicon dioxide and graphene; based on the total mass of the chemical mechanical polishing liquid, the mass percentage of the graphene is 4 wt%.
[0062] Specifically, the particle size of the graphene is 100-200 nm.
[0063] Specifically, the pH of the chemical mechanical polishing solution is 9.5.
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