Liquid crystal display device and manufacturing method thereof
一种液晶显示装置、制造方法的技术,应用在非线性光学、仪器、光学等方向,能够解决不能获得光导电性、残留图像特性下降、电阻值高等问题,达到改善残留图像特性、画质优良的效果
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1)
[0060] figure 1 It is a sectional view showing the structure of Embodiment 1 of the present invention, figure 2 It is a plan view showing Example 1. in the right figure 1 and figure 2 Before proceeding, use the Figure 3 ~ Figure 6 The mechanism by which the afterimage persists for a long time will be described. The residual image includes a so-called DC residual image in which the pattern burns and gradually disappears when the same screen appears, and a so-called AC residual image in which the residual image is generated due to a reduction in the alignment performance of the alignment film. The present invention is a device for countermeasures against so-called DC afterimages.
[0061] image 3 It shows the state in which charges are accumulated on the surface of the alignment film 130 after a predetermined pattern is displayed. exist image 3 In, scanning lines 10 are formed on the TFT substrate 100, and scanning lines 10 are formed on the scanning lines 10 Figu...
Embodiment 2)
[0080] Figure 11 It is a sectional view showing the structure of Embodiment 2 of the present invention in the display area, Figure 12 is its floor plan. exist Figure 6 In the conventional example shown, since the alignment film 113 of the light-shielding portion has no photoconductive effect, the electrical resistance is high, and there is a problem that charges accumulated in the light-shielding portion cannot quickly move to the opening. This embodiment has a feature that the resistance of the alignment film 113 of the light-shielding portion is reduced even if the photoconductive effect is not obtained.
[0081] Figure 11 In Example 2 shown, after the alignment film 113 is formed, the opening 55 is shielded with the photomask 80, and only the shielded portion is irradiated with ultraviolet rays. The TFT substrate 100 on which the alignment film 113 was formed was placed on the hot plate 70, and the substrate was heated at 200° C. to 210° C. while irradiating ultravi...
PUM
| Property | Measurement | Unit |
|---|---|---|
| wavelength | aaaaa | aaaaa |
| coating thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 


