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Thin film transistor liquid crystal display (LCD) array substrate

A technology for thin film transistors and liquid crystal displays, which is applied in the fields of instruments, nonlinear optics, optics, etc., can solve the problems of reduced display quality of thin film transistor displays

Active Publication Date: 2015-05-20
BEIHAI HKC OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In view of this, the object of the present invention is to provide a thin film transistor liquid crystal display array substrate to solve the problem of the existing thin film transistor liquid crystal display array substrate due to the offset of the exposing machine within the allowable range perpendicular to the direction of the gate lines. Display quality degradation issues

Method used

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  • Thin film transistor liquid crystal display (LCD) array substrate
  • Thin film transistor liquid crystal display (LCD) array substrate
  • Thin film transistor liquid crystal display (LCD) array substrate

Examples

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Embodiment 1

[0041] This embodiment discloses a thin film transistor liquid crystal display array substrate, such as image 3 shown ( image 3 for two adjacent pixel areas), including:

[0042] A substrate (not shown in the figure), the substrate is a glass substrate or a substrate of other materials.

[0043] A first metal layer, the first metal layer is arranged on the surface of the substrate, and gate lines G11, G12 and a common line C11 are arranged in the first metal layer, and a gate is arranged on the gate line, and the The common line C11 is U-shaped in each of its corresponding pixel regions, and conducts through the first layer of metal in a direction parallel to the gate line G11 or G12.

[0044] A gate insulating layer (not shown in the figure), the gate insulating layer is provided on the surface of the first metal layer, and an active layer is provided on the surface of the gate insulating layer above the gate of the gate line 11.

[0045] A second metal layer, the secon...

Embodiment 2

[0054] This embodiment discloses a manufacturing method of the thin film transistor liquid crystal display array substrate provided by the above-mentioned embodiment, and the manufacturing method is as follows: Image 6 shown, including:

[0055] Step S1 , providing a substrate, forming a first metal layer on the surface of the substrate, and etching the first metal layer to form gate lines and common lines.

[0056] Specifically, the substrate is a glass substrate or a substrate of other materials.

[0057] Forming gate lines on the surface of the substrate specifically includes:

[0058] Plasma sputtering is used to form the first metal layer on the surface of the substrate, that is, the substrate is first put into a reaction chamber, high-energy particles hit a solid plate of high-purity target material, and atoms are knocked out according to the physical process. The knocked out atoms pass through the vacuum and are finally deposited on the surface of the substrate to ob...

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Abstract

The invention discloses a thin film transistor liquid crystal display (LCD) array substrate which comprises a first metal layer and a second metal layer. A gate line and a common line are arranged in the first metal layer, and a data line, a source electrode and a drain electrode are arranged in the second metal layer. The distance between the gate line and the side, close to the gate line, of a drain electrode storage capacitor area is larger than the distance between the gate line and the side, close to the gate line, of the common line. The distance between the gate line and the side, away from the gate line, of the drain electrode is larger than the distance between the gate line and the side, away from the gate line, of a common line storage capacitor area. In the manufacturing process of the data line, the source electrode and the drain electrode, a feed-through voltage of a pixel corresponding to the data line is not prone to change greatly along with the change of gate-drain capacitance if an exposure machine deflects along a direction perpendicular to the gate line, the phenomenon that the changing inconsistency of the gate-drain capacitance causes an uneven feed-through voltage of the pixel in the thin film transistor LCD array substrate is prevented from happening, and the display quality of a thin film transistor display is improved.

Description

technical field [0001] The invention belongs to the field of liquid crystal display, and in particular relates to a thin film transistor liquid crystal display array substrate. Background technique [0002] In the prior art, the three sub-pixel regions of one main pixel region of the thin film transistor liquid crystal display array substrate are respectively r (red), g (green), b (blue), wherein each main pixel region is a square or a circle. shape, and each sub-pixel area is a rectangle. [0003] Current pixel structures generally include the following: a pixel structure driven by a single gate, a pixel structure driven by a double gate, and a pixel structure driven by a triple gate. Currently, single-gate and double-gate pixel structures are commonly used. Under the same resolution, the TFT-LCD with the dual-gate structure uses more gate driving chips and fewer source driving chips than the TFT-LCD with the single-gate structure. Since the cost and power consumption of...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/1362G02F1/1368
Inventor 周思思夏志强
Owner BEIHAI HKC OPTOELECTRONICS TECH CO LTD