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Washing method for TFT substrate

A substrate and post-cleaning technology, applied in the direction of liquid cleaning methods, cleaning methods and utensils, chemical instruments and methods, etc., can solve the problems of affecting the coating effect of TFT substrates, increasing the risk of TFT substrate fragmentation, and reducing efficiency.

Inactive Publication Date: 2013-07-10
WGTECH JIANGXI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] However, there are certain defects in the cleaning method of the above-mentioned TFT substrate. For example, the surface of the cleaned TFT substrate will show stains of polishing slurry (which cannot be wiped off), resulting in residual stains on the surface of the TFT substrate, which will affect the effect of the subsequent TFT substrate coating. ; In addition, the above-mentioned stains can only be removed by secondary polishing slurry grinding, which increases the risk of fragmentation of the TFT substrate and reduces the efficiency

Method used

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  • Washing method for TFT substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] Spraying white vinegar evenly on the surface of the TFT substrate ground by the polishing slurry, wherein the polishing slurry contains cerium oxide.

[0037] Wipe off the white vinegar on the surface of the TFT substrate with a sponge block wrung out of water.

[0038] Spray the surface of the TFT substrate with pure water.

[0039] Wipe and remove the pure water on the surface of the TFT substrate with a sponge block wrung out of water.

[0040] Place the TFT substrate vertically in pure water and float up and down for 2 times for soaking for 5 seconds, and let it dry naturally to obtain a cleaned TFT substrate.

[0041] Observed with the naked eye under light, the surface of the cleaned TFT substrate obtained by the above method has no residual stains, and the surface is smooth, indicating that the cleaning method of the TFT substrate has a better cleaning effect.

Embodiment 2

[0043] Spraying white vinegar evenly on the surface of the TFT substrate ground by the polishing slurry, wherein the polishing slurry contains cerium oxide.

[0044] Wipe off the white vinegar on the surface of the TFT substrate with a sponge block wrung out of water.

[0045] Spray the surface of the TFT substrate with pure water.

[0046] Wipe and remove the pure water on the surface of the TFT substrate with a sponge block wrung out of water.

[0047] Place the TFT substrate vertically in pure water and float up and down for 3 times for soaking for 10 seconds, and then dry it naturally to obtain a cleaned TFT substrate.

[0048] Observed with the naked eye under light, the surface of the cleaned TFT substrate obtained by the above method has no residual stains, and the surface is smooth, indicating that the cleaning method of the TFT substrate has a better cleaning effect.

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Abstract

The invention provides a washing method for a TFT substrate. The washing method comprises the following steps: vinegar or acetum is evenly spayed on the surface of the TFT substrate which is polished by polishing paste, wherein the polishing paste contains cerium oxide; the vinegar or the acetum on the surface of the TFT substrate is wiped away; and pure water is used to wash the surface of the TFT substrate, the surface of the TFT substrate is dried naturally and the washed TFT substrate is obtained. According to the washing method for the TFT substrate, acetic acid in the vinegar or the acetum reacts with the cerium oxide chemically, so that the cerium oxide is changed into cerium ions and dissolved in the vinegar or the acetum, and residual polishing paste stains on the surface of the TFT substrate are removed. Washing effects are good. Second polishing by the polishing paste is not needed, so that power consumption is reduced and efficiency of the TFT substrate is increased.

Description

technical field [0001] The invention relates to the field of TFT substrates, in particular to a method for cleaning a TFT substrate. Background technique [0002] The traditional cleaning method of TFT (Thin Film Field Effect Transistor) substrate is as follows: put the TFT substrate ground by polishing slurry in the washing table, spray the surface of the TFT substrate with pure water, and then wipe the surface of the TFT substrate with a wrung-out sponge , and then place the TFT substrate in a pure water tank to float up and down for 2 to 3 times for soaking, take it out and dry it naturally to obtain a cleaned TFT substrate. [0003] However, there are certain defects in the cleaning method of the above-mentioned TFT substrate. For example, the surface of the cleaned TFT substrate will show stains of polishing slurry (which cannot be wiped off), resulting in residual stains on the surface of the TFT substrate, which will affect the effect of the subsequent TFT substrate c...

Claims

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Application Information

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IPC IPC(8): H01L21/02B08B3/08
Inventor 吴玉龙张迅易伟华
Owner WGTECH JIANGXI
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