Liquid crystal display panel and manufacturing method thereof

Abstract

The invention discloses a liquid crystal display panel and a manufacturing method thereof. The liquid crystal display panel comprises data lines, scanning lines and a semiconductor layer, wherein the data lines and the scanning lines are vertically and horizontally crossed on a substrate and used for crossly limiting pixel electrodes and thin film transistors in a pixel region; transparent public electrodes forming storage capacitors with the pixel electrodes are also arranged in the pixel region; each thin film transistor comprises a grid electrode, a source electrode and a drain electrode; the semiconductor layer is formed along with the transparent public electrodes; and the semiconductor layer and the transparent public electrodes are all positioned on the substrate. According to the liquid crystal display panel, few limitations are in the manufacturing process, so that the transparent public electrodes between adjacent pixels can be directly connected, the impedance of the transparent public electrodes is reduced, and the voltage distribution of the public electrodes is more uniform; and the manufacturing method is a mask-saving manufacturing process, so that the number of light masks in the manufacturing method of the liquid crystal panel with the transparent storage capacitors can be reduced to be 4 or 5, the production capacity can be increased, and the cost can be saved.

Description

technical field [0001] The present invention relates to a liquid crystal display panel and a manufacturing method thereof. Background technique [0002] The resolution of liquid crystal displays continues to improve, but the demand for environmental protection and energy saving also increases. In order to meet the aforementioned trend, the aperture ratio needs to be increased. Currently, there are designs using transparent electrodes as storage electrodes. [0003] BOE patent CN200910078374.4 proposes a TFT-LCD array substrate and its manufacturing method, which is to add a layer of ITO in the pixel area of ​​the array substrate and the pixel electrode ITO to form a storage capacitor. The storage capacitor will not affect the transmittance of the pixel area, thereby improving the aperture ratio and display brightness, and improving the display quality as a whole. In this way, although a larger storage capacitor can be formed, the kickback voltage and leakage can be reduced....

AI Technical Summary

Problems solved by technology

However, since the ITO layer in the pixel area has a double-layer structure, it is necessary to add a photomask, and the number of photomasks is large (6), and the common electrode formed by the ITO is limited by the pixel design, and it is necessary to use a contact hole to connect the pixels between each pixel. The common electrode is connected. As we all know, the resistance formed by the contact hole is very large, on the order of hundreds of ohms, which is a great test for the uniformity of the voltage on the common electrode layer.

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