Capacitive touch screen and manufacturing method thereof
A technology of capacitive touch screen and bridging layer, which is applied in the direction of electrical digital data processing, instrumentation, input/output process of data processing, etc., and can solve problems such as ghost light transmittance
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
preparation example Construction
[0042] see figure 2 , the preparation method of the capacitive touch screen of an embodiment, comprises the steps:
[0043] S101. Provide a glass substrate, where the glass substrate includes a first surface and a second surface.
[0044] S102. Using vacuum magnetron sputtering to sputter indium tin oxide on the first surface, the sensing layer includes a plurality of first sensing blocks and second sensing blocks that are insulated from each other, and the thickness of the sensing layer is The sensing layer is the same color as the glass substrate. After testing, its comprehensive performance is good.
[0045] In this embodiment, vacuum magnetron sputtering is adopted, the sputtering temperature is 350°C-400°C, the sputtering speed is 0.9m / s-1.2m / s, and the sputtering oxidation is sputtered by the sputtering method with 6 targets connected. Indium tin, obtain indium tin oxide film layer. Then, the desired ITO pattern is obtained through exposure, development, and etching ...
Embodiment 1
[0061] (1) Use a cleaning machine to wash the glass substrate sequentially with water, alkali, BJ spray, DI spray, and high-pressure spray. The cleaning speed is 3.5m / s, the cleaning temperature is 20°C, and the cleaning pressure is 0.7kg / cm 2 , cleaning the dirt and dust on the surface of the glass substrate; and then drying with cold air and hot air to obtain a glass substrate with a clean surface, including the first surface and the second surface.
[0062] (2) When the sputtering temperature is 350°C, the sputtering speed is 0.9m / s, and the vacuum degree is 2*10 -2 , sputtering indium tin oxide on the first surface of the glass substrate by connecting 6 targets, the sputtering time is 10s, and then exposing, developing and etching to obtain the sensing layer, the thickness of the sensing layer is
[0063] (3) Coating the POC material and etching to obtain the first insulating layer and the second insulating layer.
[0064] (4) When the sputtering temperature is 350°C,...
Embodiment 2
[0069] (1) Use a cleaning machine to wash the glass substrate sequentially with water, alkali, BJ spray, DI spray, and high-pressure spray. The cleaning speed is 3.5m / s, the cleaning temperature is 25°C, and the cleaning pressure is 1.2kg / cm 2 , cleaning the dirt and dust on the surface of the glass substrate; and then drying with cold air and hot air to obtain a glass substrate with a clean surface, including the first surface and the second surface.
[0070] (2) When the sputtering temperature is 370°C, the sputtering speed is 1.0m / s, and the vacuum degree is 3*10 -2 , sputtering indium tin oxide on the first surface of the glass substrate by connecting 6 targets, the sputtering time is 12s, and then exposing, developing and etching to obtain the sensing layer, the thickness of the sensing layer is
[0071] (3) Coating the POC material and etching to obtain the first insulating layer and the second insulating layer.
[0072] (4) When the sputtering temperature is 370°C,...
PUM
| Property | Measurement | Unit |
|---|---|---|
| adhesivity | aaaaa | aaaaa |
| transmittivity | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 