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Capacitive touch screen and manufacturing method thereof

A technology of capacitive touch screen and bridging layer, which is applied in the direction of electrical digital data processing, instrumentation, input/output process of data processing, etc., and can solve problems such as ghost light transmittance

Active Publication Date: 2016-05-25
WGTECH JIANGXI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, traditional OGS touch screens are mainly made of metal bridge structures, which are prone to ghosting and low light transmittance.

Method used

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  • Capacitive touch screen and manufacturing method thereof
  • Capacitive touch screen and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0042] see figure 2 , the preparation method of the capacitive touch screen of an embodiment, comprises the steps:

[0043] S101. Provide a glass substrate, where the glass substrate includes a first surface and a second surface.

[0044] S102. Using vacuum magnetron sputtering to sputter indium tin oxide on the first surface, the sensing layer includes a plurality of first sensing blocks and second sensing blocks that are insulated from each other, and the thickness of the sensing layer is The sensing layer is the same color as the glass substrate. After testing, its comprehensive performance is good.

[0045] In this embodiment, vacuum magnetron sputtering is adopted, the sputtering temperature is 350°C-400°C, the sputtering speed is 0.9m / s-1.2m / s, and the sputtering oxidation is sputtered by the sputtering method with 6 targets connected. Indium tin, obtain indium tin oxide film layer. Then, the desired ITO pattern is obtained through exposure, development, and etching ...

Embodiment 1

[0061] (1) Use a cleaning machine to wash the glass substrate sequentially with water, alkali, BJ spray, DI spray, and high-pressure spray. The cleaning speed is 3.5m / s, the cleaning temperature is 20°C, and the cleaning pressure is 0.7kg / cm 2 , cleaning the dirt and dust on the surface of the glass substrate; and then drying with cold air and hot air to obtain a glass substrate with a clean surface, including the first surface and the second surface.

[0062] (2) When the sputtering temperature is 350°C, the sputtering speed is 0.9m / s, and the vacuum degree is 2*10 -2 , sputtering indium tin oxide on the first surface of the glass substrate by connecting 6 targets, the sputtering time is 10s, and then exposing, developing and etching to obtain the sensing layer, the thickness of the sensing layer is

[0063] (3) Coating the POC material and etching to obtain the first insulating layer and the second insulating layer.

[0064] (4) When the sputtering temperature is 350°C,...

Embodiment 2

[0069] (1) Use a cleaning machine to wash the glass substrate sequentially with water, alkali, BJ spray, DI spray, and high-pressure spray. The cleaning speed is 3.5m / s, the cleaning temperature is 25°C, and the cleaning pressure is 1.2kg / cm 2 , cleaning the dirt and dust on the surface of the glass substrate; and then drying with cold air and hot air to obtain a glass substrate with a clean surface, including the first surface and the second surface.

[0070] (2) When the sputtering temperature is 370°C, the sputtering speed is 1.0m / s, and the vacuum degree is 3*10 -2 , sputtering indium tin oxide on the first surface of the glass substrate by connecting 6 targets, the sputtering time is 12s, and then exposing, developing and etching to obtain the sensing layer, the thickness of the sensing layer is

[0071] (3) Coating the POC material and etching to obtain the first insulating layer and the second insulating layer.

[0072] (4) When the sputtering temperature is 370°C,...

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Abstract

The invention provides a capacitive touch screen which comprises a glass substrate, an induction layer, a bridging layer, a second insulating layer, a first lead, a second lead and a protection layer. The glass substrate comprises a first surface and a second surface, the induction layer is made of indium tin oxide, is arranged on the first surface and comprises a plurality of first induction blocks and second induction blocks which are insulated at intervals, the color of the induction layer is as same as that of the glass substrate by the aid of the thickness, the bridging layer is made of indium tin oxide and is electrically connected with the second induction blocks adjacent to the bridging layer, a first insulating layer is arranged among the bridging layer and the first induction blocks, the color of the bridging layer is as same as that of the glass substrate by the aid of the thickness, the second insulating layer is arranged on the bridging layer and the second induction blocks, the first lead and the second lead are arranged at the edge of the first surface and are respectively connected with the induction layer and the bridging layer, the protection layer is made of silicon dioxide, the capacitive touch screen has less ghost in etching by the aid of the thickness of the protection layer, and light transmittance is high. The invention further provides a preparation method of the capacitive touch screen.

Description

technical field [0001] The invention relates to a capacitive touch screen, in particular to a capacitive touch screen and a preparation method thereof. Background technique [0002] The capacitive touch screen is to paste a layer of transparent special metal conductive substance on the glass surface. When a finger touches the metal layer, the capacitance of the contact will change, causing the frequency of the oscillator connected to it to change. By measuring the frequency change, the touch position can be determined to obtain information. The main components of the capacitive touch screen are the substrate, the indium tin oxide (Indiumtinoxide, ITO) transparent electrode film deposited on the substrate, the metal lead electrode layer film deposited on the substrate, the silicon dioxide film covering the ITO transparent electrode and the metal lead electrode layer , and a transparent resin film covering the silicon dioxide film. [0003] After several years of development...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G06F3/044
Inventor 张迅张伯伦易伟华
Owner WGTECH JIANGXI