Semiconductor component coating film processing method
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- 合肥彩虹蓝光科技有限公司
- Publication Date
- 2013-08-21
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
[0001] technical field
[0002] The invention relates to the technical field of semiconductors, and more specifically, relates to a coating process method for semiconductor elements.
[0003] Background technique
[0004] In the existing semiconductor LED manufacturing process, when the back is coated with a reflective film, if the back coating layer is impenetrable to the stealth dicing laser, during the process of crystal dicing, the reflection of the laser on the metal layer will cause A situation where stealth dicing cannot be performed from the back-plated surface occurs. When the back-plated reflective film layer contains metal, if the invisible cutting is performed from the front side of the die, that is, the non-back-plated surface, since the laser action is close to the LED epitaxial layer (EPI layer), it is easy to cause component leakage. In order to solve the problem that invisible dicing cannot be performed from the back-plated surface after the back-p...