Unlock instant, AI-driven research and patent intelligence for your innovation.

Thermal annealing process

An annealing and copolymer technology, which is applied in metal material coating process, photoplate making process of patterned surface, decorative art, etc., can solve the problems of ineffective thermal annealing, etc.

Active Publication Date: 2013-09-25
ROHM & HAAS ELECTRONICS MATERIALS LLC +1
View PDF4 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, it is conventional knowledge in the art that the use of poly(styrene)-b-poly(dimethylsiloxane) block copolymers does not thermally anneal effectively in this operation

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Thermal annealing process
  • Thermal annealing process
  • Thermal annealing process

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0051] Example 1: Preparation of hydroxyl-terminated polyethylene brushes

[0052] Cyclohexane (1500 g) was added in a 2 liter glass reactor under nitrogen atmosphere. Styrene (50.34 g) was then added to the reactor via cannula. The contents of the reactor were then heated to 40°C. A solution of sec-butyllithium (19.18 g) diluted at 0.32M in cyclohexane was then rapidly added to the reactor via cannula, causing the contents of the reactor to turn yellow. The contents of the reactor were stirred for 30 minutes. The contents of the reactor were then cooled to 30°C. Ethylene oxide (0.73 g) was then passed into the reactor. The contents of the reactor were stirred for 15 minutes. Then 20 mL of a 1.4 M solution of HCl in methanol was added to the reactor. The polymer in the reactor was then isolated by precipitation in isopropanol at a ratio of 500 mL polymer solution / 1250 mL isopropanol. The resulting precipitate was then filtered and dried overnight in a vacuum oven at 6...

Embodiment 2

[0053] Embodiment 2: Preparation of PS-b-PDMS diblock copolymer

[0054] In a 500 mL round bottom reactor were added cyclohexane (56 g) and styrene (16.46 g) under an argon atmosphere. The contents of the reactor were then warmed to 40°C. Then 7.49 g of a 0.06 M solution of sec-butyllithium in cyclohexane was quickly added to the reactor via cannula, causing the contents of the reactor to turn yellow-orange. The contents of the reactor were then stirred for 30 minutes. A small portion of the reactor contents was then withdrawn from the reactor into a small round bottom flask containing anhydrous methanol for gel chromatography analysis of the polystyrene blocks formed. Then 22.39 g of a 21 wt % solution of freshly grown sublimated hexamethylcyclotrisiloxane in cyclohexane were transferred to the reactor. The contents of the reactor were reacted for 20 hours. Then dry tetrahydrofuran (93ml) was added to the reactor, and the reaction was continued for 7 hours. Trimethylch...

Embodiment 3

[0055] Embodiment 3: Preparation of PS-b-PDMS diblock copolymer

[0056] In a 500 mL round bottom reactor were added cyclohexane (90 mL) and styrene (18.4 g) under an argon atmosphere. Then 0.5 mL of a 1.4 M solution of sec-butyllithium in cyclohexane was added rapidly to the reactor via cannula, causing the contents of the reactor to turn yellow-orange. The contents of the reactor were then stirred for 30 minutes. A small portion of the reactor contents was then withdrawn from the reactor into a small round bottom flask containing anhydrous methanol for gel chromatography analysis of the polystyrene blocks formed. Next 2,2,5,5-tetramethyldisilafuran (337 mg) was added to the reactor. Slowly, the orange color started to disappear and after 1 hour the reactor contents were yellowish. Then 10.1 g of fresh sublimated hexamethylcyclotrisiloxane were transferred to the reactor. The reactor contents were reacted for 1.5 hours until the contents of the reactor were colorless. ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
dispersityaaaaaaaaaa
Login to View More

Abstract

The invention relates to a thermal annealing process. A method for processing a substrate is provided and comprises providing a substrate having a surface; providing a copolymer composition, comprising a poly(styrene)-b-poly(dimethylsiloxane) block copolymer component, wherein the number average molecular weight of the poly(styrene)-b-poly(dimethylsiloxane) block copolymer component is 25 to 1,000 kg / mol; applying a film of the copolymer composition to the surface of the substrate; optionally, baking the film; heating the film at 275 to 350[deg.] C. under a gaseous atmosphere having an oxygen concentration of <=7.5 ppm for a period of 1 second to 4 hours; and, treating the annealed film to remove the poly(styrene) from the annealed film and to convert the poly(dimethylsiloxane) in the annealed film to SiOx.

Description

technical field [0001] The present invention relates to the field of self-assembled block copolymers. In particular, the present invention is directed to a specific thermal annealing process for poly(styrene)-b-poly(dimethylsiloxane) block copolymer film compositions deposited on a substrate surface. Background technique [0002] Certain block copolymers, which consist of two or more different homopolymers linked at the ends, are known to self-assemble into periodic microdomains with characteristic dimensions ranging from 10 nanometers to 50 nanometers (nm). The possibility of using such micro-domains to pattern surfaces is of increasing interest due to the cost and difficulty of patterning at nanoscale dimensions (especially below 45 nm) using photolithography. [0003] However, controlling the lateral distribution of block copolymer domains on substrates remains a challenge. This problem has previously been addressed using lithographically predefined topographic maps and...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C09D7/00H01L21/033B81C1/00
CPCB05D1/005B05D3/0254B05D7/02B81C1/00031B81C2201/0149C08G77/442C09D151/08C09D183/10G03F7/0002H01L21/0337H01L21/31058H01L21/31138C01B33/113H01L21/0273H01L21/3247
Inventor 张诗玮J·温霍尔德P·赫斯塔德P·特雷福纳斯
Owner ROHM & HAAS ELECTRONICS MATERIALS LLC