Composition for combating oxidation and alleviating detrimental effects on skin caused by asian dust

A harmful effect, composition technology, applied in the direction of skin care preparations, skin diseases, drug combinations, etc., can solve problems such as lack of charm, skin irritation and inflammatory reactions, cell death, etc., to achieve skin problem prevention, prevention and treatment Effects of skin aging and skin protection

Active Publication Date: 2013-11-27
AMOREPACIFIC CORP
View PDF1 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although the skin even provides strong protection against external virus attacks, excessive exposure to ultraviolet rays, pollutants, etc. may cause skin irritation and inflammatory reactions such as erythema, edema, itching, etc.
Skin problems caused by these environmental factors make people unattractive, and active oxygen increases to a level that cannot be handled by the antioxidant protection system of cells, which is harmful to DNA, protein, fat, and sugar, and has adverse effects on cell survival, growth, and differentiation. Negatively affect and may lead to cell death

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Composition for combating oxidation and alleviating detrimental effects on skin caused by asian dust
  • Composition for combating oxidation and alleviating detrimental effects on skin caused by asian dust
  • Composition for combating oxidation and alleviating detrimental effects on skin caused by asian dust

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0062] Dosage Form Embodiment 1 Lotion

[0063]

Embodiment 2

[0064] Dosage Form Embodiment 2 Cream

[0065]

[0066]

Embodiment 3

[0067] Dosage Form Example 3 Facial Mask

[0068]

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The present invention relates to a composition for combating oxidation and alleviating the detrimental effects on skin caused by Asian Dust, the composition containing Melia azedarach bark and Nelumbo nucifera leaf extracts as a novel skin irritation alleviating agent. More specifically, the present invention contains Melia azedarach bark and Nelumbo nucifera leaf extracts, and entails: detoxification and expulsion of toxins by increasing the expression of NQO1 which is an enzyme that detoxifies toxins and of GSTT1 which is an enzyme that expels toxins; protection of the skin by increasing the expression of the skin antimicrobial peptide hBD3 which is a natural immune factor; and suppression of the production of active oxygen by increasing expression of the antioxidant proteins GPX1, catalase, Trx1 and Prdx1. Consequently, the invention has the advantages of skin protection and ageing suppression.

Description

technical field [0001] The present invention relates to a composition for anti-oxidation and alleviating the harmful effects of Asian dust on the skin, more specifically, to a composition for anti-oxidation and alleviating the harmful effects of Asian sand on the skin, the The composition contains neem bark and lotus leaf as active ingredients. Background technique [0002] The skin is the part of the body that is directly exposed to the external environment. It acts as a barrier to protect the vital organs of the body, preventing excessive water loss and protecting the body from infection. Although the skin even provides strong protection against external viral attacks, excessive exposure to ultraviolet rays, pollutants, etc. may cause skin irritation and inflammatory reactions such as erythema, edema, itching, etc. Skin problems caused by these environmental factors make people unattractive, and active oxygen increases to a level that cannot be handled by the antioxidant...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A61K36/58A61K36/62A61K8/97A61P17/00A61P39/06A61Q19/00
CPCA61Q19/00A61K36/58A61K8/97A61K36/62A61K8/9789A61P17/00A61P39/06A61K2300/00A23L33/105A23V2002/00A23V2200/318
Inventor 崔玹金善美文诚浩林亨峻金知贤李泰龙申东旭姜鹤熙
Owner AMOREPACIFIC CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products