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Double-workpiece long-stroke measuring device and method of use thereof

A measuring device and workpiece table technology, which is applied in the direction of photolithographic exposure device, electrical components, semiconductor/solid-state device manufacturing, etc., can solve the problem of large Y-direction size of the workpiece table system, which has not been considered

Active Publication Date: 2016-03-30
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantage of this solution is that the long-stroke measuring device has a large dimension in the Y direction, which leads to a large Y-direction dimension of the workpiece table system. At the same time, this measurement scheme does not take into account how to Make the workpiece table return to the working zero position, and when the Y-direction motion control of the workpiece table fails, how to prevent the grating ruler reading head on the measuring bracket from colliding with the workpiece table and causing damage

Method used

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  • Double-workpiece long-stroke measuring device and method of use thereof
  • Double-workpiece long-stroke measuring device and method of use thereof
  • Double-workpiece long-stroke measuring device and method of use thereof

Examples

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Embodiment 1

[0046] Please focus on reference Figure 1 to Figure 3 ,Such as Figure 1 to Figure 3 As shown, the embodiment of the present invention provides a double workpiece table long-stroke measuring device, which is used to control the position of the workpiece table (such as a precision workpiece table such as a silicon wafer table or a mask table) in real time for precise photolithography processing Operation, the long stroke measuring device of the double workpiece table includes:

[0047] Coarse-motion planar motor device 10, which is used to move the workpiece tables WST1, WST2 so that the workpiece tables WST1, WST2 move along the X-axis, Y-axis or Z-axis direction on the upper surface of the coarse-motion planar motor device 10, or Rotate along the Rx axis, Ry axis or Rz axis;

[0048] Two guide rails 20, the two guide rails 20 are respectively arranged on both sides of the coarse motion planar motor device 10, and the guide rails 20 are used to place the measuring device us...

Embodiment 2

[0064] The differences between the measuring bracket of the double-workpiece table long-stroke measuring device provided in this embodiment and the measuring bracket described in the first embodiment above are as follows:

[0065] Please focus on reference Figure 4 and Figure 5 ,Such as Figure 4 and Figure 5 As shown, the cross-sectional shape of the sensor bracket 52 is U-shaped, the bracket body 51 is located in the U-shaped groove of the sensor bracket 52, and the X-direction grating ruler 53 and the permanent magnetic steel sheet 55 are all arranged on the The bottom of the bracket body 51, the X-direction grating encoder 54 and the Hall differential sensor 56 are both arranged on the plane in the U-shaped groove of the sensor bracket 52, and the X-direction grating encoder 54 and the Hall differential sensor The sensors 56 are respectively aligned with the X-direction grating encoder 54 and the permanent magnetic steel sheet 55 in the Z direction, and the Y-directi...

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Abstract

The present invention provides a two-workpiece table long travel measurement apparatus and a use method thereof, wherein the two-workpiece table long travel measurement apparatus is provided for real-timely controlling a position of a silicon wafer table or a mask table and other precision workpiece tables so as to carry out precise photoetching processing operation. The two-workpiece table long travel measurement apparatus comprises a coarse movement plane motor device, two guide rails, two long travel plane measurement devices and a control system. With the apparatus, the long travel plane measurement device can automatically move along a Y direction along with the workpiece table; and with the elastic buffer device in the long travel plane measurement device, when control of workpiece table long travel movement is subjected to failure, it can be ensured that the measurement sensor is not be damaged, the position signal of the workpiece table can be acquired and can be fed back to the control system of the apparatus to control the workpiece to reset back to the work zero position.

Description

technical field [0001] The invention relates to a semiconductor photolithography process, in particular to a long-stroke measuring device with a double-workpiece stage and a method for using the same. Background technique [0002] In semiconductor lithography equipment, the motion system of precision workpiece stages such as silicon wafer stage and mask stage is an extremely important key component. Its positioning accuracy directly affects the performance of lithography equipment, and its operating speed directly affects the production efficiency of lithography equipment. The main functions that the workpiece table system usually needs to complete are: material transmission, fast stepping, constant speed scanning, etc. The typical structural form of the existing precision workpiece table system is as follows: the entire workpiece table is composed of a coarse motion table and a micro motion table, among which the coarse motion table is composed of an X-Y workpiece table, wh...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20H01L21/68
Inventor 陈军袁志扬
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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