Polysilicon Deposition Device

Abstract

The invention relates to a polycrystalline silicon deposition device comprising a reaction chamber, silicon core rods with the number of N and a jacket unit. The silicon core rods are disposed in the reaction chamber, each comprise a pair of silicon rods energized through current, are heated by the current and deposit polycrystalline silicon through the reaction of process gas; the jacket unit comprises receiving holes with the number of M; the receiving holes receive the silicon core rods each comprising a pair of silicon rodS; the process gas is supplied to the receiving holes for reaction; and the jacket unit cools the pairs of the silicon rods of the silicon core rods of the receiving holes with the number of M.

Description

technical field [0001] The present invention relates to a polysilicon deposition device, more specifically, a polysilicon deposition device for depositing polysilicon on the surface of a silicon core rod by supplying a process gas to a working space containing a silicon core rod. Background technique [0002] Polycrystalline silicon, called polysilicon, is widely used as a material in cutting-edge industries such as the semiconductor and solar industries. The polysilicon used in such cutting-edge industries as the semiconductor and solar industries is produced by reduction reaction of quartz or sand with carbon to produce metallic silicon, and then undergoes a further refining process to be used as a single crystal material for semiconductor wafer manufacturing or a solar cell substrate. materials used. [0003] Polysilicon production methods are mainly divided into Siemens method (Siemens), fluidized bed (Fluidizedbed) method and vapor-liquid deposition method (VLD: Vapor-...

AI Technical Summary

Problems solved by technology

[0006] However, the technical configuration and features disclosed in the prior literatures are composed of rods and a plurality of oil jackets that respectively surround and cool the rods. Therefore, when polysilicon deposition is completed on the outer surface of each rod, it is necessary to separate the rods. The oil jacket, which has the problem of increased process cycle time

[0007] In addition, the rods disclosed in the existing prior literature have parts exposed outside the oil jacket, so a large amount of silicon powder may be generated due to the radiant heat between a pair of rods, so there is a possibility that a large amount of silicon powder will be generated, resulting in a decrease in quality, etc., which will reduce the production of polysilicon. Yield problem

Images