A vacuum processing system valve assembly and chemical vapor deposition system
A chemical vapor deposition and vacuum treatment technology, which is applied in gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of sealing the processing chamber and the transmission chamber, difficult conduction control, and complex structure of the sealing valve. , to achieve strong corrosion resistance, improve the effect of sealing and conduction, and improve the effect of working stability
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[0053] As mentioned in the background, in the PECVD process, in order to improve the production efficiency of PECVD thin film deposition, the PECVD processing chamber includes a plurality of reaction sub-chambers. However, in view of the large length of the opening between each reaction sub-chamber and the transmission chamber, and the sealing of both sides of the valve (between the transmission chamber and each reaction sub-chamber) during the PECVD film deposition process Due to the large pressure difference and the pressure difference between each reaction sub-chamber, it is difficult to ensure the sealing of each reaction sub-chamber 2 in the thin film deposition process by using a single sealing valve. Therefore, in the existing PECVD system, an independent sealing valve is generally set between each reaction sub-chamber and the transmission chamber, and the sealing or opening linkage control between the sealing valves is realized through the transmission mechanism, so as ...
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