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Nano impressing method

A nano-imprinting and nano-technology, applied in the field of micro-machining, can solve the problems of unstable product effect, cumbersome process, unfavorable promotion and application, etc., and achieve the effects of being conducive to promotion and application, simple operation steps and reducing manufacturing cost.

Inactive Publication Date: 2014-01-15
WUXI IMPRINT NANO TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Traditional thermal embossing needs to be realized under high temperature and high pressure conditions, and even under high temperature and high pressure conditions, it may still cause the polymer to not completely fill the cavity of the stamp. This method not only reduces work efficiency but also produces poor product effects. Stable; the traditional UV curing embossing process is cumbersome, difficult to process, and high in cost, which is not conducive to popularization and application

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] A nanoimprint method, comprising the steps of:

[0015] (1) Drop the monomer solution on the substrate to be imprinted;

[0016] (2) Press the template onto the substrate, causing the monomer solution to disperse and fill the cavities in the template;

[0017] (3) Put the template and substrate obtained in step (2) into the nanoimprint machine. After the substrate and the template are optically aligned, irradiate the imprinted area with ultraviolet light through the template, and remove the template after curing ;

[0018] (4) Etching the residual layer and performing pattern transfer.

[0019] The pressure for pressing the template onto the substrate in the step (2) is 40N.

[0020] The monomer solution is methyl methacrylate.

[0021] The template is made of silicon.

Embodiment 2

[0023] A nanoimprint method, comprising the steps of:

[0024] (1) Drop the monomer solution on the substrate to be imprinted;

[0025] (2) Press the template onto the substrate, causing the monomer solution to disperse and fill the cavities in the template;

[0026] (3) Put the template and substrate obtained in step (2) into the nanoimprint machine. After the substrate and the template are optically aligned, irradiate the imprinted area with ultraviolet light through the template, and remove the template after curing ;

[0027] (4) Etching the residual layer and performing pattern transfer.

[0028] The pressure for pressing the template onto the substrate in the step (2) is 60N.

[0029] The monomer solution is methyl acrylate.

[0030] The template is made of silicon carbide.

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PUM

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Abstract

The invention discloses a nano impressing method which comprises the following steps of: (1) dropping a monomer solution on a liner to be impressed; (2) pressing a template on the liner, and dispersing the monomer solution and filling into a cavity in the template; (3) putting the template obtained in the step (2) into a nano impressing machine, after the liner is optically aligned with the template, penetrating ultraviolet light through a template radiation impressing area, solidifying and forming, and subsequently removing the template; and (4) etching a residual layer and transferring the pattern. The nano impressing method disclosed by the invention is simple in operation steps, convenient and flexible to use and beneficial for population and application, and has the advantages of environmental protection, high efficiency and the like.

Description

technical field [0001] The invention relates to the field of micromachining, in particular to a nano-imprint method. Background technique [0002] At present, nanoimprinting is mainly divided into two types: thermal imprinting and UV curing imprinting. Traditional thermal embossing needs to be realized under high temperature and high pressure conditions, and even under high temperature and high pressure conditions, it may still cause the polymer to not completely fill the cavity of the stamp. This method not only reduces work efficiency but also produces poor product effects. Stable; the traditional UV curing embossing process is cumbersome, difficult to process, and high in cost, which is not conducive to popularization and application. Contents of the invention [0003] Purpose of the invention: In order to overcome the deficiencies in the prior art, the nanoimprinting method provided by the present invention is simple, easy to implement, low in cost, and suitable for p...

Claims

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Application Information

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IPC IPC(8): G03F7/00
Inventor 王晶
Owner WUXI IMPRINT NANO TECH
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