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A Wide Cell Insulated Gate Bipolar Transistor

A technology of bipolar transistors and insulated gates, applied in electrical components, semiconductor devices, circuits, etc., can solve the problems of increasing system complexity, high manufacturing cost, and complicated manufacturing, and achieve high peak current capability and current rise rate , Meet the effect of pulse power application and high current growth capability

Active Publication Date: 2016-01-20
UNIV OF ELECTRONICS SCI & TECH OF CHINA +1
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, there are some disadvantages in this category: for example, the device is a normally-on device, and a negative voltage needs to be provided to the gate when the device is turned off, which not only increases the complexity of the system, but also brings potential danger to the system safety; at the same time, the device’s The production process of triple diffusion makes its production complicated, high production cost, low yield, etc.

Method used

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  • A Wide Cell Insulated Gate Bipolar Transistor
  • A Wide Cell Insulated Gate Bipolar Transistor
  • A Wide Cell Insulated Gate Bipolar Transistor

Examples

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Embodiment

[0034] Taking the conventional structure IGBT with a withstand voltage of 1300V and the WC-IGBT provided by the present invention as examples for simulation and comparison, it is intuitively demonstrated that the structure of the present invention has performance advantages over conventional IGBTs in the field of pulse power applications. Conventional MCT structures such as Figure 5 As shown, the width of the N-type source region used in the WC-IGBT provided by the present invention is 142 μm, and the doping concentration dose of the P-type base region is 5.32×10 13 cm -2 , the cell structure in this example can be a square structure or a long strip structure, and the square structure is such as Figure 12 and Figure 13 As shown, the elongated structure is as Figure 14-Figure 17 shown. Such as Figure 11 As shown, because the internal thyristor is in the latched state when the WC-IGBT is on, the WC-IGBT has a peak current much higher than that of the conventional IGBT....

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Abstract

The present invention relates to semiconductor technology, in particular to an insulated gate bipolar transistor suitable for pulse power applications. A wide cellular insulated gate bipolar transistor of the present invention has a cellular structure comprising an anode structure consisting of an anode 9 and an anode region 5, an N-type drift region 4 located on the anode region 5, and an N-type drift region 4 located on the anode region 5. The gate 7 and the cathode 8 on the top, the N-type drift region 4 is provided with a P-type base region 3, and the P-type base region 3 is provided with an N-type source region 1 and a P-type cathode region 2, which is characterized in that , the width of the N-type source region 1 is 50-200 μm, and the doping concentration of the P-type base region 3 is 1×1013-8×1013 cm-2. The invention has the beneficial effects of providing a WC-IGBT device with high peak current capability and high current growth capability, and solving the problem that the IGBT cannot be well adapted to the application field of pulse power. The invention is particularly applicable to insulated gate bipolar transistors for pulsed power applications.

Description

technical field [0001] The present invention relates to semiconductor technology, in particular to an insulated gate bipolar transistor suitable for pulse power applications. Background technique [0002] Power semiconductor devices, as switching devices, can be applied in both the power electronics field and the pulse power field. In the field of power electronics, a conventional insulated gate bipolar transistor (Insulated Gate Bipolar Transistor, IGBT for short) is widely used as a switching device because of its superior performance. In the field of power electronics applications, in order to prevent parasitic thyristor latch-up in IGBT devices, thereby improving the device's forward safe operating area (SOA), the development trend of its device technology is to use smaller line widths to achieve smaller device cells. (Cell) size, while using a lower P-type base doping concentration, etc. At the same time, researchers have also proposed some new device structures and p...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L29/739H01L29/06H01L29/08
CPCH01L29/1095H01L29/7395
Inventor 陈万军杨骋肖琨王珣阳张波
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA