Acid adding method and device for stokehole cleaning machine

A technology of acid adding device and cleaning machine, which is applied in cleaning methods and appliances, cleaning methods using liquids, chemical instruments and methods, etc., and can solve problems such as pollution of diffusion furnace tubes, dirty cleaning of silicon wafers, corrosion of silicon wafers, etc. , to achieve a wide range of applications, reduce silicon wafer scorching, and reduce waste

Inactive Publication Date: 2014-03-26
HEFEI HAREON SOLAR TECH
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Problems solved by technology

In order to ensure the cleaning effect, the proportion of the solution must be ensured. Too much acid will easily cause the silicon wafer to be corroded too much. A large area of ​​the surrounding silicon wafers is scorched, which will seriously pollute the furnace tube of the diffusion furnace
In order to ensure the ratio of acid concentration, it must be confirmed that the amount of acid added is constant. The traditional method of acid replenishment is: when the flow rate of acid liquid is constant, the amount of acid added is controlled by controlling the opening and closing time of the valve and the fluid replenishment coefficient. The way of adding acid is easily affected by the flow rate. In actual operation, the flow rate of acid liquid cannot be uniform. This method of adding acid has a large error

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  • Acid adding method and device for stokehole cleaning machine

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Embodiment Construction

[0014] Such as figure 1 As shown, the acid adding device of the present invention includes a constant pressure tank for storing acid, a high liquid level sensor, a middle liquid level sensor and a cleaning tank; the high liquid level sensor and the middle liquid level sensor are located inside the constant pressure tank, and the constant pressure The surface of the tank is marked with a scale, which is convenient for adjusting the distance between the high liquid level sensor and the medium liquid level sensor. The constant pressure tank is connected with the cleaning tank through the acid adding pipeline.

[0015] Make the opening of the acid feeding pipeline moderate, and adjust the distance between the liquid level sensors so that the volume of acid required for the cleaning process is an integer multiple of the acid volume between the middle liquid level and the high liquid level. The level sensor automatically detects whether the liquid in the constant pressure tank reach...

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Abstract

The invention discloses an acid adding method and device for a stokehole cleaning machine. The acid adding method and device has the advantages that by changing the flow type acid adding into the liquid level type acid adding, accuracy of acid prepared liquor amount is increased, acid concentration ratio error is reduced, the risks of silicon wafer burning and furnace tube and silicon wafer clamping tool pollution caused by unclean washing is reduced, and chemical waste is reduced, utilization rate of chemicals is increased. In addition, the method and device is widely applicable to various solution proportioning.

Description

technical field [0001] The invention relates to a furnace cleaning machine in a crystalline silicon solar ultra-clean workshop, in particular to a method for adding acid to a furnace cleaning machine and a device thereof. Background technique [0002] At present, in the production process of solar cells, in order to prevent the silicon wafers from being scorched due to impurities during high-temperature diffusion, which will affect the quality of the silicon wafers, the silicon wafers are cleaned by a furnace cleaning machine before diffusion, and the furnace cleaning machine mainly Wash with HCL and HF solution to remove impurities and metal ions in the silicon wafer. In order to ensure the cleaning effect, the proportion of the solution must be ensured. Too much acid will easily cause the silicon wafer to be corroded too much. A large area of ​​the surrounding silicon wafers is scorched, which will seriously pollute the furnace tube of the diffusion furnace. In order to ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B13/00B08B3/08
CPCH01L21/0209H01L21/02052H01L21/02096H01L21/67023
Inventor 汪俊
Owner HEFEI HAREON SOLAR TECH
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