A symmetrical grating heterodyne interference secondary diffraction measurement device
A secondary diffraction and heterodyne interference technology, applied in the direction of measuring devices, optical devices, instruments, etc., to achieve high repeatable measurement accuracy, high measurement resolution, and small impact
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[0037] Taking n=2 as an example, implement the device and method of the present invention.
[0038] refer to figure 1 , to demonstrate the whole measurement process of the symmetric grating heterodyne interferometry secondary diffraction measurement. The measuring device includes a laser 1, a 1 / 4 wave plate 2, a spectroscopic system 3, a reference light path photoelectric conversion system 4, a negative 2-level measuring light path polarization beam splitter 5, a negative 2-level measuring light path first 1 / 4 wave plate 6, The second 1 / 4 wave plate of the negative 2-stage measurement optical path 7, the mirror 8 of the negative 2-stage measurement optical path, the polarization beam splitter 9 of the positive 2-stage measurement optical path, the first 1 / 4 wave plate 10 of the positive 2-stage measurement optical path, and the positive 2-stage Measuring optical path second 1 / 4 wave plate 11, positive secondary measuring optical path reflector 12, grating 13, central reflecto...
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