Early warning system and optical equipment

Abstract

The invention provides a pre-warning system and an optical device. The pre-warning system is used for changing early warning of a filter system. The pre-warning system comprises a light source module for providing testing incident light, a receiving module used for receiving flowing out gas filtered by the filter system and reflecting the testing incident light, and a control module used for comparing the power of the testing reflected light with the power of the testing incident light and giving an alarm when the filter system is judged to be replaced according to the comparing result, wherein the testing incident light is transmitted to the receiving module, and the testing reflected light is obtained through the reflection of the testing incident light. According to the pre-warning system, early warning for the using condition of the filter system is given in time by monitoring the atomization situation of the receiving module, a worker is prompted to replace the filter system, and the negative effects caused by the optical component atomization of the optical device are avoided.

Description

technical field [0001] The invention relates to the technical field of display manufacturing, in particular to an early warning system and optical equipment. Background technique [0002] In the field of semiconductor manufacturing, especially liquid crystal panel production, due to the cleanliness requirements of optical device manufacturing, most optical equipment is equipped with a filter system to filter volatile chemical substances or impurities entering the optical equipment, such as exposure machine is one of them . [0003] The exposure machine is an indispensable equipment in the Array process-Photo process. The full name of the exposure machine is Mirror Projection Mask Aligner (mirror projection mask alignment device). Its function is to expose the glass substrate coated with photoresist, and use light to The light sensitivity of the resist projects the image format on the mask onto the glass substrate. [0004] The exposure machine mainly relies on its precise ...

AI Technical Summary

Problems solved by technology

However, the clean air in the product manufacturing line is sometimes polluted. For example, when the spin coater is cleaned, the resist volatilizes to cause air pollution, or the IPA (isopropyl alcohol) used for cleaning the production line volatilizes, etc. will also cause clean air. polluted

[0005] In the process of realizing the present invention, the inventor found at least the following problems in the prior art: the ultra-low permeability air filter system (ULPA Filter: Ultra Low Penetration AirFilter) of the exposure machine can filter more than 99.999% of particles with a diameter of 0.1um Particles, but long-term accumulation, the efficiency of the filter system will decrease. When these volatile chemical substances passing through the filter system adhere to the surface of the optical element to form atomization, the atomization will cause a decrease in illumination, and the power of the high-pressure mercury lamp will increase. Reduced service life and greatly shortened lifetime of optics

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