Manufacturing method of tungsten silicon target material
A manufacturing method and target technology, which are applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems such as the inability to meet the quality requirements of the target material and the low density of the tungsten-silicon target material, and achieve excellent sputtering. The effect of injection performance, fast production speed, and environmental protection and cleanliness in the preparation process
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Example Embodiment
[0031] Please refer to figure 1 , figure 1 It is a flow chart of a method for preparing a tungsten-silicon target in an embodiment of the present invention. Such as figure 1 As shown, the preparation method of the tungsten-silicon target provided by the embodiment of the present invention mainly includes the following steps:
[0032] Step S1, providing tungsten powder and silicon powder;
[0033] Step S2, mixing the tungsten powder and the silicon powder using a wet mixing process to form a mixed powder;
[0034] Step S3, using a cold pressing process to make the mixed powder into a tungsten-silicon target blank;
[0035] Step S4, using a vacuum hot pressing process to make the tungsten-silicon target blank into a tungsten-silicon target.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap