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An optomechanical crystal microcavity based on nanobeam structure

A nano-beam, opto-mechanical technology, used in nano-optics, nanotechnology, nanotechnology, etc.

Active Publication Date: 2016-03-30
TSINGHUA UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Although the study of cavity optomechanics has shown an extremely bright research prospect, there are still many physical and technical difficulties to be explored in the related research progress.

Method used

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  • An optomechanical crystal microcavity based on nanobeam structure
  • An optomechanical crystal microcavity based on nanobeam structure
  • An optomechanical crystal microcavity based on nanobeam structure

Examples

Experimental program
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Embodiment 1

[0035] see Figure 1 to Figure 3 , figure 1 A schematic structural diagram of an optomechanical crystal microcavity based on a nanobeam structure is provided for an embodiment of the present invention. The optomechanical crystal microcavity includes: a silicon substrate 1, a silicon dioxide isolation layer 2, a silicon flat plate 3, a top layer two Silicon oxide layer 4 and air isolation region 8 .

[0036] The silicon substrate 1 is used to carry the entire optomechanical crystal microcavity.

[0037] The silicon dioxide isolation layer 2 is used to isolate the silicon substrate 1 and the silicon plate 3 .

[0038] The silicon plate 3 is located on the silicon dioxide isolation layer 2, and the silicon plate 3 includes an input waveguide region 5, an optomechanical crystal microcavity region 6, and an output waveguide region 7 arranged in sequence. The input waveguide region 5 is used to receive optical signals and transmit the optical signals to the optomechanical crystal...

Embodiment 2

[0051] see figure 1 , an embodiment of the present invention provides a nano-beam structure-based optomechanical crystal microcavity comprising: a silicon substrate 1, a silicon dioxide isolation layer 2, a silicon flat plate 3, a top silicon dioxide layer 4 and an air isolation region 8. The principle of its structural design is the same as that of Embodiment 1, and will not be repeated here. figure 1 The optomechanical crystal microcavity shown is a substrate wafer composed of silicon-silicon dioxide-silicon, in which the thickness of the silicon dioxide layer is 3 μm, and the thickness of the upper silicon is 220 nm. Electron beam exposure and dry etching are used to fabricate an optomechanical crystal microcavity region 6 with a nanobeam structure, an input waveguide region 5 and an output waveguide region 7 on the uppermost silicon plate 3 . The input waveguide region 5 and the output waveguide region 7 are respectively located at the input and output ends of the optome...

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Abstract

The invention provides a calendar crystal microcavity based on a nano beam structure. The calendar crystal microcavity comprises a silicon substrate, a silicon dioxide isolation layer, a silicon slab, a top silicon dioxide layer and an air isolation area. The silicon substrate is used for bearing the whole calendar crystal microcavity. The silicon dioxide isolation layer is used for isolating the silicon substrate from the silicon slab. The silicon slab is arranged on the silicon dioxide isolation layer, and comprises an input waveguide area, a calendar crystal microcavity area and an output waveguide area, the input waveguide area, the calendar crystal microcavity area and the output waveguide area are arranged in sequence, the input waveguide area is used for receiving optical signals and transmitting the optical signals to the calendar crystal microcavity area, and the calendar crystal microcavity area comprises silicon waveguide and an air hole array, and is used for a local photon and phonon defect mode to achieve the coupling of photons and phonons. The output waveguide area is used for outputting the optical signals. The top silicon dioxide layer is arranged on the silicon slab and is matched with the silicon dioxide isolation layer to protect the silicon slab. The air isolation area is arranged above and below the calendar crystal microcavity area, and arranged between the silicon dioxide isolation layer and the top silicon dioxide layer.

Description

technical field [0001] The invention relates to the technical field of silicon-based micro-nano photonic devices, in particular to an optomechanical crystal microcavity based on a nanobeam structure. Background technique [0002] In the context of major breakthroughs in mesoscopic physics and quantum fields in the new century, cavity optomechanics based on optomechanical crystal microcavities has become a new research direction that has attracted attention rapidly in recent years. Cavity optomechanics studies the interaction between photons and mechanical vibrations, and phonons are the quantized description of mechanical vibrations in material lattices. Therefore, cavity optomechanics enables people to extend the manipulation of quantum states to quasi-particles—phonons. Compared with the quantum manipulation of elementary particles, the manipulation of quasiparticle phonons represents the highest level of quantum state manipulation. It can be predicted that the use of cav...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B6/122B82Y20/00
Inventor 崔开宇李永卓黄翊东冯雪刘仿张巍
Owner TSINGHUA UNIV