Developer composition for flat panel display
A technology of composition and developer, applied in the direction of photosensitive material processing, etc., can solve the problems such as the defoaming effect is difficult to last, insufficient, and the stability of developer is reduced, and achieves a wide operating temperature range, reduces the formation of film slag, and develops Excellent effect
Active Publication Date: 2014-04-16
TSINGHUA UNIV
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Problems solved by technology
In the current mainstream spray (SPRAY) development process, the developer is fully sprayed onto the exposed photoresist through the nozzle for development, and the developer is easy to foam; in addition, when the photoresist is developed, tiny bubbles will be generated when air enters , forming a bubble
The residual foam will block the contact between the developer and the photoresist, resulting in insufficient removal of the unexposed photoresist and poor development effect, thereby affecting the integrity and fineness of the wiring (Japanese Patent Application Publication No. 10-010749)
In order to suppress the side effects caused by foam, it is common to add defoamers to the developer, but some defoamers dissolve or disperse the resist continuously during the use of the developer, and the defoaming effect is difficult to last (Japan Japanese Patent Laid-Open Publication No. 10-293964)
[0006] 2. Residual metal ions
[0007] 3. Film slag
However, due to the limited solubility of surfactants in alkaline solutions, especially inorganic alkaline solutions, during the transportation and storage of alkaline developing solutions, white turbidity and stratification will occur due to temperature changes, resulting in a decrease in the stability of the developing solution. , affecting normal use
Method used
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Embodiment 1
[0070] Embodiment 1, preparation developing solution S1
[0071] Add 0.5% of the organic amine ethanolamine shown in formula I, 0.5% of B1251 nonionic surfactant, and 7% of dimethyl sulfoxide into 92% of water, and stir evenly at room temperature to obtain the developer provided by the present invention. Liquid S1. Wherein, the water used is deionized water, and the total metal ion concentration in the deionized water is not more than 50 nanograms per liter.
Embodiment 2-18
[0072] Embodiment 2-18, preparation of developing solution S2-S18
[0073] Prepare according to the same method as in Example 1, only the type and weight percentage of the organic amine shown in formula I, the nonionic surfactant shown in formula II, and the organic solvent are replaced as described in Table 1, and according to the alkali used The weight percent of active compound, the weight percent of nonionic surfactant, the weight percent of organic solvent and the sum of water are 100% as a principle, determine the weight parts of deionized water used in each embodiment, obtain table respectively Each developer S2-S7 listed in 1.
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The invention discloses a developer composition for flat panel display. The composition comprises the following components: an organic amine compound shown in Formula I, a nonionic surfactant shown in Formula II, organic solvents and water. The developer composition has excellent developing performance, low foam, and good dispersion stability to color resistor, and effectively reduces the formation of flux film. The developer composition has other features of no metal ion residue, good developing performance, no residue, wide range of operation temperature, and low environment pollution. In the developing preparation process of the photosensitive resin, the developer composition has wide application. (img file='DDA0000449734320000011.TIF' wi='1022' he='832' / ).
Description
technical field [0001] The invention belongs to the field of flat panel display and relates to a developer composition for flat panel display. Background technique [0002] In the process of flat panel display, in order to obtain the required wiring pattern, it is necessary to use photoresist to coat the substrate to form a thin film, then cover it with a mask and expose it, and then develop it with an alkaline developer to remove the unexposed part , so as to obtain the desired wiring pattern. [0003] Commonly used photoresists are alkali-soluble resins, such as phenolic resins, acrylic resins, and poly(p-hydroxystyrene), which are usually irradiated with ultraviolet light to change the molecular structure of the polymer resin and its solubility in alkali substances, so as to be able to Soluble in alkaline developer. [0004] With the continuous improvement of people's display effect, in order to achieve better color representation and higher fineness, COA (ColorFilter O...
Claims
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Inventor 梁晓唐洪田博
Owner TSINGHUA UNIV