System for comprehensively measuring multiple parameters of fiber optic interferometer

A fiber optic interferometer and comprehensive measurement technology, which is applied in the direction of testing optical performance, can solve problems such as unseen measurement, achieve the effect of eliminating jumps and errors, and the measurement process is simple

Inactive Publication Date: 2014-04-30
INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
View PDF4 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

And about the initial phase Measurements of the initial phase have not yet been seen Reports related to measurement

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • System for comprehensively measuring multiple parameters of fiber optic interferometer
  • System for comprehensively measuring multiple parameters of fiber optic interferometer
  • System for comprehensively measuring multiple parameters of fiber optic interferometer

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0023] Please refer to the attached figure 1 , the present invention provides a multi-parameter comprehensive measurement system of an optical fiber interferometer, comprising:

[0024] A narrow linewidth tunable semiconductor laser a is used to provide signal light for transmission.

[0025] Optical isolator b, its input end is connected with the output end of narrow-linewidth tunable semiconductor laser a, and its output port is connected with optical fiber interferometer port 1, is used to reduce the impact of scattered light such as Rayleigh scattered light on the laser, with Protect the laser from working stably for a long time;

[0026] Interferometer c, its port 1 is connected to the output end of the optical isolator b, its port 2 is connected to the input port of the photodetector d, and its port 3 is connected to the carrier circuit d, which is used to generate the PZT phase of the transmitted optical signal Modulated signal;

[0027] The output port of the carrie...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

Disclosed is a system for comprehensively measuring multiple parameters of a fiber optic interferometer. The system comprises a semiconductor laser unit with tunable narrow linewidth, an opto-isolator, the interferometer, a carrier wave circuit, a photoelectric detector, a data acquisition card and a data-processing machine, wherein the semiconductor laser unit is used for providing transmission signal light, the input end of the opto-isolator is connected with the output end of the semiconductor laser unit with the tunable narrow linewidth, a port 1 of the interferometer is connected with the output end of the opto-isolator, the interferometer is used for reducing the influence of rayleigh scattering light on the laser unit so as to protect the laser unit to work stably for a long time, the output end of the carrier wave circuit is connected with a port 3 of the interferometer, the carrier wave circuit is used for providing the interferometer with PZT modulating signals, the input end of the photoelectric detector is connected with a port 2 of the interferometer, the input end of the data acquisition card is connected with the output end of the photoelectric detector, the data acquisition card is used for converting received optical signals into electric signals, the input end of the data-processing machine is connected with the output end of the data acquisition card, and the data-processing machine is used for processing digital signals collected by the data acquisition card and giving out parameter values through nonlinearity minimum least squares and fitting by using visibility, modulation amplitude and initial phase difference as undetermined parameters.

Description

technical field [0001] The invention belongs to the field of optical fiber sensing, and particularly relates to a multi-parameter comprehensive measurement system of an optical fiber interferometer. The system uses the least square sum method to directly obtain the visibility, modulation amplitude and initial phase difference of the optical fiber interferometer through multi-parameter fitting. Basic parameters, so as to realize the comprehensive measurement of multi-parameters of fiber optic interferometer. Background technique [0002] Optical fiber sensing has been widely used in large-scale structure safety monitoring, downhole safety monitoring, offshore oil and gas detection, seismic detection and other fields. Optical fiber sensing is divided into intensity type, phase type, polarization type, wavelength type, etc. according to different optical measurements. Among them, the phase measurement of optical fiber has the advantages of high sensitivity and large dynamic ori...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G01M11/02
Inventor 徐团伟方高升李芳刘育梁
Owner INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap