Liquid polishing wax composition

A technology of composition and polishing wax, which is applied in the field of polishing wax, can solve problems such as surface dryness, lack of polishing wax surface, lack of surface reflection, etc., and achieve the effects of high polishing efficiency, excellent cutting force, and large cutting volume

Inactive Publication Date: 2014-05-07
NINGBO YUNTONG CHEM TECH CO LTD
View PDF3 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The existing polishing wax has a layer of white mist on the surface of the polishing wax, which is not bright enough, and the polishing wax is relatively soft; or the polished surface is relatively bright but the surface reflection is lacking; or the polishing wax surface lacks gloss, the polishing wax is not round, and the surface is dry and cracked.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] Liquid polishing wax composition 1, the component that this composition 1 comprises and mass percentage thereof are as follows:

[0024] Calcined alumina polishing powder 29%, stearic acid 12%, paraffin wax 3%, butter 4%, palm oil 9%, water 28%, monoglyceride 10% and trimeric Chunan 5%.

[0025] Mix the above materials and stir evenly to obtain Composition 1.

[0026] The above-mentioned composition 1 is coated on the stainless steel, the surface of the product is relatively smooth, the luster is clear, and the excess polishing wax is easy to clean.

Embodiment 2

[0028] Liquid polishing wax composition 2, the component that this composition 2 comprises and mass percentage thereof are as follows:

[0029] 40% Iron Red, 3.5% Stearic Acid, 0.5% Paraffin, 1% Butter, 10% Palm Oil, 35% Water, 7% Monoglyceride and 3% Trimeric Chunan.

[0030] Mix the above materials and stir evenly to obtain Composition 1.

[0031] The above-mentioned composition 2 is coated on the aluminum material, the surface of the product is relatively smooth, the luster is clear, and the excess polishing wax is easy to clean.

Embodiment 3

[0033] Liquid polishing wax composition 3, the components and mass percentages thereof that this composition 3 comprises are as follows:

[0034] Chromium Oxide 55%, Stearic Acid 4%, Paraffin 0.5%, Butter 2%, Palm Oil 4%, Water 25%, Monoglyceride 2.5%, Trimeric Chunan 4% and Silicone Oil 3%.

[0035] Mix the above materials and stir evenly to obtain Composition 3.

[0036] The above-mentioned composition 3 is coated on the copper material, the surface of the product is relatively smooth, the gloss is cleaned, and the excess polishing wax is easy to clean.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention brings forward a liquid polishing wax composition. The composition comprises, by mass, 25 to 55% of a stone milling agent, 3.5 to 15% of stearic acid, 0.5 to 3% of paraffin, 1 to 5% of animal oil, 4 to 10% of plant oil, 25 to 36% of water, 1 to 10% of monoglyceride and 0.5 to 5% of an emulsifier. The liquid polishing wax composition has an excellent cutting force, high polishing efficiency, great cutting output and clear luster and the characteristics of clearness and convenience.

Description

technical field [0001] The invention relates to the technical field of polishing wax, in particular to a liquid polishing wax composition. Background technique [0002] In the manufacturing process of stainless steel appliances, polishing is generally an essential process. At present, the polishing process mainly used is to carry out physical and mechanical polishing of the product on a polishing machine with polishing wax. [0003] The existing polishing wax has a layer of white mist on the surface of the polishing wax, which is not bright enough, and the polishing wax is relatively soft; or the polished surface is relatively bright but the surface reflection is lacking; or the polishing wax surface lacks gloss, the polishing wax is not round, and the surface is dry and cracked. . Contents of the invention [0004] The invention aims at the disadvantages of the prior art, and provides a liquid polishing wax composition. The liquid polishing wax combination key has excel...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C09G1/02
Inventor 杨双龙
Owner NINGBO YUNTONG CHEM TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap