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Chemical Vapor Deposition Device

A chemical vapor deposition and gas technology, which is applied in the fields of chemical reactive gas, gaseous chemical plating, chemical instruments and methods, etc., can solve the problems of high manufacturing cost and difficult cleaning, and achieves reduced difficulty, easy cleaning, and gas distribution. uniform effect

Active Publication Date: 2017-12-29
DEPOSITION EQUIP & APPL SHANGHAI LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0012] The chemical vapor deposition device in the prior art has the problems of high manufacturing cost and difficulty in cleaning. The present invention provides a chemical vapor deposition device capable of solving the above problems

Method used

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  • Chemical Vapor Deposition Device
  • Chemical Vapor Deposition Device
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Embodiment Construction

[0030] In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0031] In the following description, many specific details are set forth in order to fully understand the present invention, but the present invention can also be implemented in other ways than those described here, so the present invention is not limited by the specific embodiments disclosed below.

[0032] The chemical vapor deposition (CVD) device of the prior art has the problems of high manufacturing cost and difficulty in cleaning. In order to solve the problems of the prior art, the present invention proposes a chemical vapor deposition device with low manufacturing cost and easy cleaning. The chemical vapor deposition device includes a reaction chamber, a spray assembly located at the top of the reaction chamber, and a base oppo...

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Abstract

The invention relates to a chemical vapor deposition device. The chemical vapor deposition device includes a reaction chamber, a spray assembly located at the top of the reaction chamber, and a base opposite to the spray assembly, the base can rotate relative to the spray assembly, and the spray assembly includes The first air intake pipeline and the second air intake pipeline are used to respectively transmit the first gas and the second gas to the gas distribution plate, the gas distribution plate has an exhaust surface facing the base, and the exhaust surface There are several grooves for receiving gas and installing plate components, the plate component has several air outlet holes, the air outlet holes are arranged in several rows, at least two rows of the air outlet holes in the several rows are partially staggered, so The outlet holes are used to discharge one or more of the first gas or the second gas. The chemical vapor deposition device of the present invention has simple structure, low manufacturing cost, and is easy to disassemble and clean.

Description

technical field [0001] The invention relates to the technical field of chemical vapor deposition, in particular to a chemical vapor deposition device. Background technique [0002] Chemical vapor deposition (Chemical vapor deposition, referred to as CVD) is a chemical reaction of reacting substances under gaseous conditions, and the formation of solid substances is deposited on the surface of a heated solid substrate to obtain solid materials. It is realized by chemical vapor deposition equipment. . Specifically, the CVD device feeds the reaction gas into the reaction chamber through the gas inlet device, and controls reaction conditions such as pressure and temperature of the reaction chamber, so that the reaction gas reacts, thereby completing the deposition process steps. In order to deposit the desired film, it is generally necessary to feed a variety of different reactive gases into the reaction chamber, and it is also necessary to feed other non-reactive gases such as...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/44C23C16/455C23C16/30C23C16/34C30B25/02C30B25/14C30B29/40
Inventor 宋涛萨尔瓦多奚明马悦黄占超刘强
Owner DEPOSITION EQUIP & APPL SHANGHAI LTD